72 research outputs found
Impact of vacuum ultraviolet photons on ultrathin polymethylmethacrylate during plasma etching
No full textThe authors acknowledge funding from the imec Industrial Affiliation Program (IIAP). Shikhar Arvind acknowledges funding from KU Leuven for their doctoral studies. The authors would like to thank Shreya Kundu of imec for their help with IBE tool. The authors would also like to thank Materials Characterization and Analysis (MCA) group at imec for their help with AFM and XPS analysis
Plasma Etch of IGZO Thin Film and IGZO/SiO2 Interface Diffusion in Inductively Coupled CH4/Ar Plasmas
No full textHigh-Density Patterning of InGaZnO by CH4: a Comparative Study of RIE and Pulsed Plasma ALE
No full textThe authors would like to thank Nouredine Rassoul (IMEC) for discussion on the HM strategy and Subhali Subhechha (IMEC) for providing a brief overview of the intended applications of IGZO. We acknowledge the support of IMECs Industrial Affiliation Program and the Active Memory Program. We also acknowledge the support of IMECs pilot line and SEM and MCA team for help with deposition and characterization processes
PESI - a taxonomic backbone for Europe
No full textThis is an open access article distributed under the terms of the Creative Commons Attribution License (CC BY 4.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.
The attached file is the published version of the article.NHM Repositor
Towards high NA patterning readiness: Materials, processes and etch transfer for P24 Line Space
No full text
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