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    Going Beyond Counting First Authors in Author Co-citation Analysis

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    The present study examines one of the fundamental aspects of author co-citation analysis (ACA) - the way co-citation counts are defined. Co-citation counting provides the data on which all subsequent statistical analyses and mappings are based, and we compare ACA results based on two different types of co-citation counting - the traditional type that only counts the first one among a cited work's authors on the one hand and a non-traditional type that takes into account the first 5 authors of a cited work on the other hand. Results indicate that the picture produced through this non-traditional author co-citation counting contains more coherent author groups and is therefore considerably clearer. However, this picture represents fewer specialties in the research field being studied than that produced through the traditional first-author co-citation counting when the same number of top-ranked authors is selected and analyzed. Reasons for these effects are discussed

    Electronic transport properties of SiGe alloys and heterostructures grown by Sb assisted MBE.

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    Electronic transport properties have been measured in thin pseudomorphic SiGe alloys and heterostructures, grown by surfactant mediated epitaxy (SME). in order to investigate the unintentional doping effects caused by Sb, used as surfactant. In alloy films. we measured at 300 K, a Hall mobility (mu(H) = 20 cm(2) V-1 s(-1)) at least one order of magnitude lower than the undoped material (mu(H) = 100 cm(2) V-1 s(-1)), grown in similar conditions, but without surfactant. At low temperatures (40 K < T < 75 K) we obtained mu(H) values of about 3.6 x 10(4) cm(2) V-1 s(-1) for SME grown material and up to 5.5 x 10(4) cm(2) V-1 S-1. for undoped ones. Above 75 K. all the alloy samples showed a mu(H) decrease with the temperature Steeply than the T-1.5 dependence. Moreover, in undoped materials we observed two distinct power law exponents. In SME (SimGen)(p) heterostructures we measured mu(H) values generally lower than 100 cm(2) V-1 s(-1) at 300 K. due to the Sb high doping level. The strong doping effect caused by Sb in SME SiGe films suggests the use of different surfactant elements or alternative growth techniques in order to fabricate Si-Ge heterostructure based devices
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