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Electron Emission Enhanced Chemical Vapor Deposition (eeecvd) For The Fabrication Of Diverse Silicon-containing Films
No full textAmorphous films (a-C:H:Si and a-C:H:Si:O) were grown in a vacuum chamber containing a hot filament on substrates held on a copper plate to which a bias voltage could be applied. This modified hot-filament chemical vapor deposition process was used to fabricate various types of amorphous thin film from mixtures of tetramethylsilane (TMS) or hexamethyldisiloxane (HMDSO) diluted in argon or argon/nitrogen mixtures. Electrical characteristics of the process, deposition rates, and film structures were investigated as a function of the deposition parameters, particularly the proportion of nitrogen in the chamber feed. For film characterization, transmission infrared spectroscopy (IRS) was employed. Without a significant substrate current, deposition rates were negligible. Thus, electron impact fragmentation of the monomer molecules is a key process in film deposition using this technique. The method shows promise and versatility for the fabrication of a wide range of amorphous films, including, for example, a-C:H and a-C:H:O. © 2001 Elsevier Science B.V. All rights reserved.398-399591596Yasuda, H., (1985) Plasma Polymerization, , Academic Press, OrlandoBrennan, G., Dunllop, D., (1992) Plasma Deposition, Treatment, and Etching of Polymers, , R. d.'Agostino (Ed.), Academic Press, BostonMota, R.P., Shiosawa, T., Durrant, S.F., Bica de Moraes, M.A., (1995) J. Vac. Sci. Technol. A, 13, p. 2747Chen, Y., Wang, E.G., Chen, F., (1996) Mod. Phys. Lett. B, 10, p. 567Durrant, S.F., Castro, S.G., Cisneros, J.I., Da Cruz, N.C., Bica de Moraes, M.A., (1994) J. Vac. Sci. Technol. A, 14, p. 118Durrant, S.F., Mota, R.P., Bica de Moraes, M.A., (1992) J. Appl. Phys, 71, p. 448Baranauskas, V., Tosin, M.C., Peterlevitz, A.C., Ceragioli, H.J., Durrant, S.F., (2000) Mater. Sci. & Eng. B, 69-70, p. 171Liu, Y., Cohen, M.L., (1989) Sci., 245, p. 841Loboda, M.J., Seifferly, J.A., Dall, F.C., (1994) J. Vac. Sci. Technol. A, 12, p. 90Aumaille, K., Vallee, C., Granier, A., Goullet, A., Gaboriau, F., Turban, G., (2000) Thin Solid Films, 359, p. 188Theil, J.A., Brace, J.G., Knoll, R.W., (1994) J. Vac. Sci. Technol. A, 12, p. 1365Zhang, Z.Y., Zhao, W., Wang, X.W., Lei, T.M., Chen, Z.M., Zhou, S.X., (2000) Mater. Sci. Eng. B - Solid State Mater. Adv. Technol., 75, p. 177Zhou, X.T., Wang, N., Au, F.C.K., Lai, H.L., Peng, H.Y., Bello, I., Lee, C.S., Lee, S.T., (2000) Mater. Sci. Technol. A - Structural Mater. Properties Microstructure and Processing, 286, p. 119Chapman, B., (1980) Glow Discharge Processes: Sputtering and Plasma Etching, p. 106. , Wiley, N.YWang, J., De Moraes, M.A.B., Landers, R., Trasferetti, B.C., Plasmas and Polymers, , submittedDa Cruz, N.C., Durrant, S.F., Bica de Moraes, M.A., (1998) J. Polym. Sci. B, Polym. Phys., 36, p. 1873Baranauskas, V., Li, B.B., Peterlevitz, A., Tosin, M.C., Durrant, S.F., (1999) J. Appl. Phys., 85, p. 7455Cai, S., Fang, J., Yu, X., (1992) J. Appl. Polym. Sci., 44, p. 13
Effects Of Helium Ion Irradiation On Fluorinated Plasma Polymers
No full textThe effects of ion irradiation on fluorinated plasma polymer films are investigated using profilometry, surface contact-angle measurements, infrared reflection absorption spectroscopy (IRRAS) and X-ray photoelectron spectroscopy (XPS). Remarkably, helium plasma immersion ion implantation (PIII) of several amorphous hydrogenated fluorinated plasma polymers deposited from C2H2-SF6, C6H6-SF6 or C6F6 produces film compactions of up to 40%, and modifies the surface energy in the 35 to 65dyn cm-1 range. As revealed by IRRAS and XPS, the films contain C-H, C-C, C=C, C=O, O-H and C-F groups. XPS spectra confirm the presence of N (typically ~5%). The films produced from SF6-containing plasmas also contain S. For irradiation times of 80min, the film carbon content is increased, and the fluorine content is greatly reduced, by factors of about 3 to 15, depending on the initial film composition. © 2010 Elsevier B.V.20418-1930593063Inagaki, N., Tasaka, S., Imai, M., (1993) J. Appl. Polym. Sci., 48, p. 1963Inagaki, N., Tasaka, S., Suzuki, Y., (1994) J. Appl. Polym. Sci., 51, p. 2131Csernica, J., Rhodes, D.B., (1999) J. Polym. Eng., 19, p. 1Durrant, S.F., Mota, R.P., de Moraes, M.A.B., (1992) J. Appl. Phys., 71, p. 448Silverstein, M.S., Chen, R., Kesler, O., (1996) Polym. Eng. Sci., 36, p. 2542Durrant, S.F., Mota, R.P., de Moraes, M.A.B., (1992) Thin Solid Films, 220, p. 295D'Agostino, R., Cramarossa, F., Caloprico, V., d'Ettole, R., (1983) J. Appl. Phys., 54, p. 1284d'Agostino, R., Cramarossa, F., Iluzzi, F., (1987) J. Appl. Phys., 61, p. 2754Mogab, C.J., Adams, A.C., Flamm, D.L., (1978) J. Appl. Phys., 49, p. 3796Lopes, B.B., Davanzo, C.U., Schreiner, W., Durrant, S.F., (2008) Surf. Coat. Technol., 203, p. 526d'Agostino, R., Cramarossa, F., Fracassi, F., Desimoni, E., Sabbatini, L., Zamboni, R.G., Caporiccio, G., (1986) Thin Solid Films, 143, p. 163Rubio-Roy, M., Bertran, E., Pascual, E., Polo, M.C., Andujar, J.L., (2008) Diamond Relat. Mater., 17, p. 1728Schvarzman, M., Mathur, A., Hone, J., Jahnes, C., Wind, S.J., (2008) Appl. Phys. Lett., 93, p. 153105Guerrouani, N., Baldo, A., Maarouf, T., Belu, A.M., Kassis, C.M., Mas, A., (2007) J. Fluorine Chem., 18, p. 925Torrisi, L., Percolla, R., (1996) Nucl. Instrum. Methods B, 117, p. 387da Cruz, N.C., Lopes, B.B., Rangel, E.C., Bica de Moraes, M.A., Durrant, S.F., (2008) Surf. Coat. Technol., 203, p. 534da Cruz, N.C., Rangel, E.C., Tabacknics, M.H., Trasferetti, B.C., Davanzo, C.U., (2001) Nucl. Instrum. Methods Phys. Res., 175, p. 721Gelamo, R.V., Landers, R., Rouxinol, F.P.M., Trasferetti, B.C., Bica de Moraes, M.A., Davanzo, C.U., Durrant, S.F., (2007) Plasma Process. Polym., 4, p. 482Gelamo, R.V., Durrant, S.F., Trasferetti, B.C., Davanzo, C.U., Rouxinol, F.P.M., Bica de Moraes, M.A., (2007) Plasma Process. Polym., 4, p. 489Bellamy, L.J., (1975) The Infrared Spectra of Complex Molecules, 1. , Chapman and Hall, LondonBuijnsters, J.G., Gago, R., Jiménez, I., Camero, M., Agulló-Rueda, F., Gómez-Aleixandre, C., (2009) J. Appl. Phys., 105, p. 093510Ghimire, D.C., Adhikari, S., Aryal, H.R., Kalita, G., Umeno, M., (2009) Diamond Relat. Mater., 18, p. 465Yao, Z.Q., Yang, P., Huang, N., Sun, H., Wang, J., (2004) Surf. Coat. Technol., 186, p. 131Hakovirta, M., Lee, D.H., He, X.M., Nastasi, M., (2001) J. Vac. Sci. Technol. A, 19, p. 782Yasuda, H., Bumgarner, M.O., Marsh, H.C., Morosoff, N., (1976) J. Polym. Sci., Polym. Chem. Ed., 14, p. 195Nelea, V., Holvoet, S., Turgeon, S., Mantovani, D., (2009) J. Appl. Phys. D, 42, p. 22520
Micro-crystalline Diamond And Nano-carbon Structures Produced Using A High Argon Concentration In Hot-filament Chemical Vapor Deposition
No full textThe carbon structures and micro-crystalline diamond produced using argon in high concentrations in a hot-filament chemical vapor deposition (CVD) reactor fed with a mixture of ethanol and hydrogen were studied. Well faceted diamond films with vertical flaws, layered structures with diamond-like carbon (DLC) balls and spongy structures of carbon wires were obtained using the method. Argon was found to minimize the growth rate of hydrogenated materials formed in the intergranular spaces of columnar CVD diamond films and at the interstitial sites of deposited carbon-nuclei structures. Modified kinetics of the carbon deposition process, increase in number of flaws between the diamond grains and increased porosity was observed due to the action of argon.19410571062Angus, J.C., Hayman, C.C., (1988) Science, 241, p. 913Yarborough, W.A., Messier, R., (1990) Science, 241, p. 688Derjaguin, B.V., Fedoseev, D., (1977) Izd., , Nauka, Moscow, Chap. 4Zhu, W., Inspektor, A., Badzian, A.R., McKenna, T., Messier, R., (1990) J. Appl. Phys., 68, p. 1489Shih, H.C., Sung, C.P., Fan, W.L., (1992) Surf. Coat. Technol., 54-55, p. 380Matsumoto, O., Toshima, H., Kanzaki, Y., (1985) Thin Solid Films, 128, p. 341Matsumoto, O., Katagiri, T., (1987) Thin Solid Films, 146, p. 283Baranauskas, V., Ceragioli, H.J., Peterlevitz, A.C., Tosin, M.C., Durrant, S.F., (2000) Thin Solid Films, 377-378, p. 303Baranauskas, V., Peled, A., Trava-Airoldi, V.J., Lima, C.A.S., Doi, I., Corat, E.J., (1994) Appl. Surf. Sci., 79-80, p. 129Barros, R.C.M., Corat, E.J., Ferreira, N.G., Souza, T.M., Trava-Airoldi, V.J., Leite, N.F., Iha, K., (1996) Diamond Relat. Mater., 5, p. 1323Condon, E.U., Odishaw, H., (1967) Handbook of Physics, , McGraw-Hill, New York, Chap. 5, Table 5.1Thareja, R.K., Dwivedi, R.K., Abbilasha, (1997) Phys. Rev. B, 55, p. 2600Nemanich, R.J., Solin, S.A., (1979) Phys. Rev. B, 20, p. 392Yoshikawa, M., Katagiri, G., Ishida, H., Ishitani, A., Ono, M., Matsumura, K., (1989) Appl. Phys. Lett., 55, p. 2608Obraztsova, E.D., Fujii, M., Hayashi, S., Kuznetsov, V.L., Butenko, Yu.V., Chuvlinin, A.L., (1998) Carbon, 36, p. 821Li, W., Zhang, H., Wang, C., Zhang, Y., Xy, L., Zhu, K., Xie, S., (1997) Appl. Phys. Lett., 70, p. 2684Zhao, X., Ando, Y., (1998) Jpn. J. Appl. Phys., Part 1, 37, p. 4846Lander, J.J., Morrison, J., (1964) Surf. Sci., 2, p. 241Baranauskas, V., Ceragioli, H.J., Peterlevitz, A.C., Tosin, M.C., Durrant, S.F., (2000) Thin Solid Films, 377-388, p. 182Baranauskas, V., Ceragioli, H.J., Peterlevitz, A.C., Durrant, S.F., Diamond Relat. Mater., , acceptedThornton, J.A., (1974) J. Vac. Sci. Technol., 11, p. 666Beale, H.A., Grossklaus, W., (1977) Thin Solid Films, 12, p. 281Thornton, J.A., (1977) Annu. Rev. Mater. Sci., 7, p. 239Shaldervan, A.I., Nakhodin, N.G., (1971) Sov. Phys. Solid State, 12, p. 1748Thornton, J.A., Hedgcoth, V.L., (1975) J. Vac. Sci. Technol., 12, p. 93Holman, W.R., Huegel, F.J., (1974) J. Vac. Sci. Technol., 11, p. 701Feist, W.M., Steele, S.R., Readey, D.W., (1969) Physics of Thin Films, 5, p. 237. , edited by G. Hass (Academic, New York
Growth Of Glassy Carbon On Natural Fibers
No full textDiamond-like carbon films were grown on pyrolised bamboo substrates by hot filament-chemical vapor deposition from ethanol/hydrogen mixtures. Different stages of deposition of films grown on untreated substrates and substrates seeded with diamond dust were compared. Changes in film morphology and structure under changes in these parameters were investigated using scanning electron microscopy and Raman spectroscopy. Diamond-like carbon (DLC) with ball-like morphology on the micrometer scale and glassy DLC with a stacked planar structure were observed for depositions of > 2 h on unseeded and seeded substrates, respectively. Gasification of the fibers by hydrogen in the early stages of growth may play a role in film growth, but this requires further study. Nevertheless, DLC films can be grown on pyrolised bamboo substrates, which suggests that other carbonaceous substrates for film fabrication by hot-filament chemical vapor deposition also merit systematic investigation. © 2002 Elsevier Science B.V. All rights reserved.3041-3271277Kojima, A., Matsumoto, H., Kamiishi, Y., Sato, M., Otani, S., (2000) Sen-I Gakkaishi, 56 (2), p. 574Bessette, R.R., Medeiros, M.G., Patrissi, C.J., Deschenes, C.M., LaFrata, C.N., (2001) J. Power Sources, 96 (1), p. 240Sea, B.K., Choo, S.Y., Lee, T.J., Morooka, S., Song, S.K., (1995) Kor. J. Chem. Eng., 12 (4), p. 416Edie, D.D., (1998) Carbon, 36 (4), p. 345Takida, T., Inoue, K., Kimura, H., Kiyota, H., Saito, I., Kurusu, T., Iida, M., (2000) New Diamond Frontier Carbon Res., 10 (1), p. 50Wang, Y.Q., Zhou, B.L., Wang, Z.M., (1995) Carbon, 33 (4), p. 427Peherson, P.E., Glesener, J., Morrish, A., (1992) Thin Solid Films, 212 (1-2), p. 81Nakamura, Y., Tamaki, K., Watanabe, Y., Hirayama, S., (1994) J. Mater. Res., 9 (7), p. 1619Gruen, D.M., (1999) Annu. Rev. Mater. Sci., 29, p. 211Corat, E.J., Trava-Airoldi, V.J., Baranauskas, V., (1998) Key Eng. Mat., 138 (1), p. 195Baranauskas, V., Tosin, M.C., Peterlevitz, A.C., Ceragioli, H.J., Durrant, S.F., (2000) J. Appl. Phys., 88 (3), p. 1650Barros, R.C.M., Corat, E.J., Ferreira, N.G., Souza, T.M., Trava-Airoldi, V.J., Leite, N.F., Iha, K., (1996) Diam. Rel. Mater., 5, p. 1323Baranauskas, V., Peterlevitz, A.C., Ceragioli, H.J., Durrant, S.F., (2001) J. Vac. Sci. Tech. A, 19 (4), p. 1057Thareja, R.K., Dwivedi, R.K., Abhilasha, (1997) Phys. Rev. B, 55 (4), p. 2600Nemanich, R.J., Solin, S.A., (1979) Phys. Rev. B, 20, p. 392Yoshikawa, M., Katagiri, G., Ishida, H., Ishitani, A., Ono, M., Matsumura, K., (1989) Appl. Phys. Lett., 55, p. 2608Ferrari, A.C., Robertson, J., (2001) Phys. Rev. B, 63, p. 63Shroder, R.E., Nemanich, R.J., Glass, J.T., (1990) Phys. Rev. B, 41, p. 3738Okada, K., Kanda, H., Komatsu, S., Matsumoto, S., (2000) J. Appl. Phys, 88, p. 1674Suzuki, T., Yagi, M., Shibuki, K., Hasemi, M., (1994) Appl. Phys. Lett., 65 (5), p. 540Li, Z.D., Wang, L., Suzuki, T., Argoitia, A., Pirouz, P., Angus, J.C., (1993) J. Appl. Phys., 73 (2), p. 715Lambrecht, W.R.L., Lee, C.H., Segall, B., Angus, J.C., Li, Z.D., Sunkara, M., (1993) Nature, 364 (6438), p. 60
Fabrication Of Smooth Diamond Films On Sio2 By The Addition Of Nitrogen To The Gas Feed In Hot-filament Chemical Vapor Deposition
Get PDFThe morphology of small roughness diamond films deposited onto thermally oxidized silicon substrates by a process of anisotropic crystalline growth induced by nitrogen in a hot-filament chemical vapor deposition (CVD) reactor was investigated. Square plates of low roughness were obtained on the top surface of the diamond films. Scanning electron microscopy (SEM), atomic force microscopy (AFM) and micro-Raman spectroscopy indicated films made up of good quality. The films possessed a large number of defects due to substitutional nitrogen. Planar defects were created due to large amount of nitrogen introduced in the CVD process. Substitutional nitrogen provoked lateral vacancies that have a catalytic effect on the lateral rate of diamond growth.19410521056Angus, J.C., Hayman, C.C., (1988) Science, 241, p. 913Yarborough, W.A., Messier, R., (1990) Science, 241, p. 688Derjaguin, B.V., Fedoseev, D., (1977) Izd., , Nauka, Moscow, Chap. 4Tankala, K., DebRoy, T., (1992) J. Appl. Phys., 72, p. 712Okano, K., Koizumi, S., Silva, S.R.P., Amaratunga, G.A.J., (1996) Nature (London), 381, p. 140Liao, X.Z., Zhang, R.J., Lee, C.S., Tong Lee, S., Lam, Y.W., (1997) Diamond Relat. Mater., 6, p. 521Dos Santos Filho, S.G., Hasenack, C.M., Lopes, M.C.V., Baranauskas, V., (1995) Semicond. Sci. Technol., 10, p. 990Jin, S., Moustakas, T.D., (1994) Appl. Phys. Lett., 65, p. 403Locher, R., Wild, C., Herres, N., Behr, D., Koidl, P., (1996) Appl. Phys. Lett., 65, p. 759Walker, J.E., (1979) Rep. Prog. Phys., 42, p. 42Evans, T., Rainey, P., (1975) Proc. R. Soc. London, Ser. A, 344, p. 111Baranauskas, V., Li, B.B., Peterlevitz, A., Tosin, M.C., Durrant, S.F., (1999) J. Appl. Phys., 85, p. 7455Baranauskas, V., Peled, A., Trava-Airoldi, V.J., Lima, C.A.S., Doi, I., Corat, E.J., (1994) Appl. Surf. Sci., 79-80, p. 129Barros, R.C.M., Corat, E.J., Ferreira, N.G., Souza, T.M., Trava-Airoldi, V.J., Leite, N.F., Iha, K., (1996) Diamond Relat. Mater., 5, p. 1323Lang, A.R., (1964) Proc. Phys. Soc., 84, p. 871Sumida, N., Lang, A.R., (1988) Proc. R. Soc. London, Ser. A, 419, p. 235Bridon, P.R., Jones, R., (1993) Physica B, 185, p. 17
Going Beyond Counting First Authors in Author Co-citation Analysis
Get PDFThe present study examines one of the fundamental aspects of author co-citation analysis (ACA) - the way co-citation
counts are defined. Co-citation counting provides the data on which all subsequent statistical analyses and mappings
are based, and we compare ACA results based on two different types of co-citation counting - the traditional type that
only counts the first one among a cited work's authors on the one hand and a non-traditional type that takes into
account the first 5 authors of a cited work on the other hand. Results indicate that the picture produced through this non-traditional author co-citation counting contains more coherent author groups and is therefore considerably clearer. However, this picture represents fewer specialties in the research field being studied than that produced through the traditional first-author co-citation counting when the same number of top-ranked authors is selected and analyzed. Reasons for these effects are discussed
Microcrystalline Diamond Deposition On A Porous Silicon Host Matrix
No full textPorous silicon (PS) is a nanostructured material obtained by etching pores into crystalline Si wafers. In this paper, we report on the nucleation and growth of diamond on very thick PS films (130-220 μm) of very high porosity (10-50%). The edges of the pores were in the form of small crosses, which followed the original directions of the 〈100〉c-Si. The diamond coating was made by chemical vapor deposition (CVD) in a hot-filament reactor. We observed that the diamond nucleation occurs mainly at the edges of the pores but relatively few nuclei follow a preferential orientation axis. As the nucleation density is very low, coalescence does not occur even after 11 h and 30 min of deposition. Using a pre-deposition `seeding' process with diamond grains, it was possible to produce a complete diamond CVD coating. A cross-section analysis of the diamond/PS/c-Si structure by scanning electron microscopy (SEM), micro-Raman and photoluminescence spectroscopies revealed interesting results: the luminescence of the PS under the diamond layer is preserved. There is no diamond deposition inside of the pores, but a small permeation of carbon was identified which forms diamond-like phases at the bottom of the pores. The Raman analyses indicated also a small contamination of the diamond layer by Si nano-crystals.69171176Canham, L.T., (1990) Appl. Phys. Lett., 57, p. 1406Angus, J.C., Hayman, C.C., (1988) Science, 241, p. 913Ke, G.Q., Xing, Z.J., Yin, X.T., Chen, K.T., Shen, Y.H., Huang, Y.P., Xu, J.Z., (1992) Vacuum, 43 (11), p. 1043Liu, Z., Zong, B.Q., Lin, Z., (1995) Thin Solid Films, 254, p. 3Lyer, S.B., Srinivas, S., (1997) Thin Solid Films, 305, p. 259Baranauskas, V., Chang, D.C., Li, B.B., Peterlevitz, A.C., Trava-Airoldi, V.J., Corat, E.J., Singh, R.K., Lee, D.-G., (2000) J. Porous Mater., 7, p. 401Baranauskas, V., Li, B.B., Peterlevitz, A.C., Trava-Airoldi, V.J., Corat, E.J., Singh, R.K., (1998) 14th International Vacuum Congress, , Birmingham, UKBaranauskas, V., Li, B.B., Peterlevitz, A.C., (1998) Diamond Science and Technology, la Jolla International School of Physics, 10 (12). , Bulletin of the Stefan UniversityBaranauskas, V., Peled, A., Trava-Airoldi, V.J., Lima, C.A.S., Doi, I., Corat, J., (1994) Appl. Surf. Sei., 79-80, p. 129Baranauskas, V., Li, B.B., Peterlevitz, A.C., Tosin, M.C., Durrant, S.F., (1999) Thin Solid Films, 351, p. 1Davies, G., Collins, A.T., (1993) Diam. Rel. Mater., 2, p. 8
Variations on the Author
Get PDF“Variations on the Author” discusses two of Eduardo Coutinho’s recent films (Um Dia na Vida, from 2010, and Últimas Conversas, posthumously released in 2015) and their contribution to the general question of documentary authorship. The director’s filmography is characterized by a consistent yet self-effacing form of authorial self-inscription: Coutinho often features as an interviewer that rather than express opinions propels discourses; an interviewer that is good at listening. This mode of self-inscription characterizes him as an author who is not expressive but who is nonetheless markedly present on the screen. In Um Dia na Vida, however, Coutinho is completely absent form the image, while Últimas Conversas, on the contrary, includes a confessional prologue that moves the director from the margins to the center of his films. This article examines the ways in which these works stand out in the filmography of a director who offers new insights into the notion of cinematic authorship
Appropriate Similarity Measures for Author Cocitation Analysis
Get PDFWe provide a number of new insights into the methodological discussion about author cocitation analysis. We first argue that the use of the Pearson correlation for measuring the similarity between authors’ cocitation profiles is not very satisfactory. We then discuss what kind of similarity measures may be used as an alternative to the Pearson correlation. We consider three similarity measures in particular. One is the well-known cosine. The other two similarity measures have not been used before in the bibliometric literature. Finally, we show by means of an example that our findings have a high practical relevance.information science;Pearson correlation;cosine;similarity measure;author cocitation analysis
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