28 research outputs found
Formation of a double acceptor center during divacancy annealing in low-doped high-purity oxygenated Si
Deep-level transient spectroscopy studies of electronic defect levels in 7-MeV proton-irradiated n-type float-zone Si with a doping of (3-5)x10(12) cm(-3) and oxygen content of similar to10(16)-10(17) cm(-3) have been performed. The thermal stability of the irradiation-induced defects has been investigated for temperatures up to 400 degreesC. It has been found that annealing of the divacancy-related levels, the singly negative, V-2(0/-), and the doubly negative, V-2(-/=), charge states at 220-300 degreesC results in the formation of a new center with singly negative, X(0/-), and doubly negative, X(-/=), charge states. The new center anneals out at 325-350 degreesC during isochronal treatment for 15 min. The capture kinetics studies reveal that the electron capture cross section of X(0/-) is larger than that of V-2(0/-) while the capture cross section of X(-/=) is close to that of V-2(-/=). The transformation of V-2(0/-) and V-2(-/=) into X(0/-) and X(-/=) is very efficient with only a small loss in the peak amplitudes, and the position of the energy levels are close to those of V-2. Hence, it is tempting to suggest that the atomic configuration of the X center is closely related to that of V-2, and a possible identification of X may be the divacancy-oxygen center (V2O).</p
The I-Imas Project: End-Users Driven Specifications for the Design of a Novel Digital Medical Imaging System
Recent advancements in the development of radiation hard semiconductor detectors for S-LHC.
The proposed luminosity upgrade of the Large Hadron Collider (S-LHC) at CERN will demand the innermost layers of the vertex detectors to sustain fluences of about 1016 hadrons/cm2. Due to the high multiplicity of tracks, the required spatial resolution and the extremely harsh radiation field new detector concepts and semiconductor materials have to be explored for a possible solution of this challenge. The CERN RD50 collaboration “Development of Radiation Hard Semiconductor Devices for Very High Luminosity Colliders” has started in 2002 an R&D program for the development of detector technologies that will fulfill the requirements of the S-LHC. Different strategies are followed by RD50 to improve the radiation tolerance. These include the development of defect engineered silicon like Czochralski, epitaxial and oxygen-enriched silicon and of other semiconductor materials like SiC and GaN as well as extensive studies of the microscopic defects responsible for the degradation of irradiated sensors. Further, with 3D, Semi-3D and thin devices new detector concepts have been evaluated. These and other recent advancements of the RD50 collaboration are presented and discussed
On the identity of a crucial defect contributing to leakage current in silicon particle detectors
Defects and diffusion in high purity silicon for detector applications
In this contribution we review some recent results on defects occurring after irradiation and thermal treatment of silicon detectors for ionizing radiation. In particular, the annealing of the prominent divacancy centre and the concurrent growth of a new double acceptor centre, assigned to the divacancy-oxygen pair, is treated in detail. The detectors were fabricated using oxygenated high purity float zone (FZ) silicon wafers of n-type in order to improve the radiation hardness. The results obtained have important implication on our current understanding of the degradation of silicon detectors at high radiation fluences and suggest that a new concept for optimised impurity/defect engineering needs to be developed.</p
Laplace transform transient spectroscopy study of a divacancy-related double acceptor centre in Si
Radiation-induced divacancy-related levels in high-purity oxygen-enriched n-type silicon have been studied with the use of deep level transient spectroscopy (DLTS) and Laplace-DLTS. It has been shown that heat treatment at 250degreesC results in a shift of the divacancy (V-2)-related peaks observed by 'standard' DLTS. Using Laplace-DLTS it is demonstrated that the shift is due to annealing of V-2 and formation of a new acceptor centre. The new centre has presumably two negative charge states: singly and doubly negative. The formation of the new centre holds a close one-to-one correlation with the annealing of V-2, indicating that the new centre is a result of divacancy interaction with an impurity or a defect. The close position of the electronic levels of the new centre to that of V-2 suggests a similar electronic and microscopic structure of the new centre to V-2, and a tentative identification is a divacancy-oxygen centre.</p
Processing and characterization of a MEDIPIX2-compatible silicon sensor with 220μm pixel size
Pixellated silicon detectors with a pixel size of 220 um have been fabricated at Mid Sweden University. The detectors will be bonded to the MEDIPIX2 [1] readout chip. The purpose is to investigate the performance of an energy sensitive X-ray imaging sensor with reduced charge sharing.The detectors were fabricated on high purity silicon with a wafer thickness of 500 um and a resistivity of more than 15 kohmcm. One reason for the choice of material was to get experience for future work with very thick detectors requiring ultra high resistivity in order to be depleted. During the initial work in this project some issued were found concerning inter pixel resistance and the efficiency of the guard rings. This led to a study of existing papers on the subject [2,3,4,5] and to extensive simulations of the electric field and the charge transport in different parts of the device.A modified process has been developed using alternating p+ and n+ guard rings and an outer n+ doping. The results of the simulations and the process will be described as well as an outline for a process for fabrication of very thick detectors with limited guard ring extension.References[1] - X. Llopart, M. Campbell, R. Dinapoli, D. San Segundo and E. Pernigotti, IEEE Trans. Nucl. Sci., vol. 49, 2279-2283, October 2002.[2] – L. Evensen, A. Hanneborg, B Sundby Avset, M. Mese, Nuclear Instruments and Methods in Physics Research A 337 (1993) 44 – 52[3] – T. Pavalainen, T. Tuuva, K. Leinonen, Nuclear Instruments and Methods in Physics Research A 573 (2007) 277 – 279[4] – Z. Li, W. Huang, L. J. Zhao, IEEE Trans. Nucl. Sci., vol. 47, No. 3. 729 – 735 , June 2000.[5] – D. Han, C. Wang, G. Wang, S. Du, L. Shen, X. Tian, X. Zhang, IEEE Transactions on Electron devices, Vol. 50, No. 2, 537 – 540, February 2003</p
