10 research outputs found
A Review of the Mechanism of Action of Amphibian Antimicrobial Peptides Focusing on Peptide-Membrane Interaction and Membrane Curvature
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No full textNot AvailableGlobally, water deficit is one of the major constraints in chickpea (Cicer arietinum L.) production due to substantial reduction in photosynthesis. Photorespiration often enhances under stress thereby protecting the photosynthetic apparatus from photoinhibition. Application of bioregulators is an alternative to counter adverse effects of water stress. Thus, in order to analyze the role of bioregulators in protecting the photosynthetic machinery under water stress, we performed an experiment with two contrasting chickpea varieties, i.e., Pusa 362 (Desi type) and Pusa 1108 (Kabuli type). Water deficit stress was imposed at the vegetative stage by withholding water. Just prior to exposure to water stress, plants were pretreated with thiourea (1,000 mg L−1), benzyladenine (40 mg L−1), and thidiazuron (10 mg L−1). Imposed water deficit decreased relative water content (RWC), photosynthetic rate (PN), quantum efficiency of PSII (Fv/Fm), and enhanced lipid peroxidation (LPO). However, bioregulator application maintained higher RWC, PN, Fv/Fm, and lowered LPO under water stress. Expression of Rubisco large subunit gene (RbcL) was low under water stress both in the Kabuli and Desi type. However, bioregulators strongly induced its expression. Although poor expression of two important photorespiratory genes, i.e., glycolate oxidase and glycine decarboxylase H subunit, was observed in Desi
chickpea under imposed stress, bioregulators in general and cytokinins in particular strongly induced their expression. This depicts that the application of bioregulators protected the photosynthetic machinery by inducing the expression of RbcL and photorespiratory genes during water deficit stress.Not Availabl
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No full textNot AvailableWater deficit is undoubtedly one of the most important environmental stresses limiting the productivity of chickpea around the world. Exogenous application of bioregulators has been found to be a novel technology for imparting stress tolerance in crop plants. This study evaluated the changes brought about by two bioregulators viz., thiourea (TU) and thidiazuron (TDZ) under water deficit stress in chickpea leaf anatomy, chloroplast ultrastructure and photosynthesis. The experiment was conducted using Pusa 362 (Desi type) chickpea variety. Imposed water deficit treatment decreased relative water content (RWC), membrane stability index (MSI) and photosynthetic rate (PN). However, bioregulators application maintained higher RWC, MSI and PN under water deficit stress. Under imposed water stress, compact palisade layers of the mesophyll tissue were disrupted and cell size of the mesophyll cells displayed drastic reduction. Chloroplast, under water stress, displayed a number of grana with lose type of thylakoid, large increase in osmiophillic granules, reduction in the amount of starch granules and overall disruption of the thylakoid membrane. Foliar application of bioregulators maintained the integrity of mesophyll tissue and chloroplast structure thereby protected the chickpea plants from the detrimental effects of water deficit stress.Not Availabl
Host Defense Peptides from Asian Frogs as Potential Clinical Therapies
No full textHost defense peptides (HDPs) are currently major focal points of medical research as infectious microbes are gaining resistance to existing drugs. They are effective against multi-drug resistant pathogens due to their unique primary target, biological membranes, and their peculiar mode of action. Even though HDPs from 60 Asian frog species belonging to 15 genera have been characterized, research into these peptides is at a very early stage. The purpose of this review is to showcase the status of peptide research in Asia. Here we provide a summary of HDPs from Asian frogs
Effect of Standoff Distance on Solid Particle Erosion Wear Behavior of Chill Cast Aluminum – Boron Carbide Composites
No full textExperimental Study on Effect of Stacking Sequence, Clearance and Clamping Torque on Strength of FRP Composite Bolted Joints
No full textEcological and Economic Potential of Major Halophytes and Salt Tolerant Vegetation in India
No full textTailoring Curie temperature and magnetic anisotropy in ultrathin Pt/Co/Pt films
No full textThe dependence of perpendicular magnetization and Curie temperature (T-c) of Pt/Co/Pt thin films on the thicknesses of Pt seed (Pt-s) and presence of Ta buffer layer has been investigated in this work. Pt and Co thicknesses were varied between 2 to 8 nm and 0.35 to 1.31 nm (across the spin reorientation transition thickness) respectively and the T-c was measured using SQUID magnetometer. We have observed a systematic dependence of T-c on the thickness of Pt-s. For 8nm thickness of Pt-s the Co layer of 0.35nm showed ferromagnetism with perpendicular anisotropy at room temperature. As the thickness of the Pt-s was decreased to 2nm, the T-c went down below 250K. XRD data indicated polycrystalline growth of Pt-s on SiO2. On the contrary Ta buffer layer promoted the growth of Pt(111). As a consequence Ta(5nm)/Pt(3nm)/Co(0.35nm)/Pt(2nm) had much higher T-c (above 300K) with perpendicular anisotropy when compared to the same stack without the Ta layer. Thus we could tune the ferromagnetic T-c and anisotropy by varying the Pt-s thickness and also by introducing Ta buffer layer. We attribute these observations to the micro-structural evolution of Pt-s layer which hosts the Co layer. (C) 2016 Author(s)
Copper dusting effects on perpendicular magnetic anisotropy in Pt/Co/Pt tri-layers
No full textThe effect of Cu dusting on perpendicular magnetic anisotropy of sputter grown Pt/Co/Pt stack in which the Cu layer is in proximity with that of Co is investigated in this work. We used magneto optic Kerr effect microscopy measurements to study the variation in the reversal mechanisms in films with Co thicknesses below 0.8nm by systematically varying their perpendicular magnetic anisotropy using controlled Cu dusting. Cu dusting was done separately above and below the cobalt layer in order to understand the role of bottom and top Pt layers in magnetization reversal mechanisms of sputtered Pt/Co/Pt stack. The introduction of even 0.3nm thick Cu layer below the cobalt layer drastically affected the perpendicular magnetic anisotropy as evident from the nucleation behavior. On the contrary, even a 4nm thick top Cu layer had little effect on the reversal mechanism. These observations along with magnetization data was used to estimate the role of top and bottom Pt in the origin of perpendicular magnetic anisotropy as well as magnetization switching mechanism in Pt/Co/Pt thin films. Also, with an increase in the bottom Cu dusting from 0.2 to 0.4nm there was an increase in the number of nucleation sites resulting in the transformation of domain wall patterns from a smooth interface type to a finger like one and finally to maze type. (C) 2016 Author(s)
