5,262 research outputs found
sj-pdf-1-ang-10.1177_00033197211052133 – Supplemental Material for A Simple Model to Predict Repeat Revascularization After Drug-Eluting Stent Implantation in Patients With Stable Coronary Artery Disease
No full textSupplemental Material, sj-pdf-1-ang-10.1177_00033197211052133 for A Simple Model to Predict Repeat Revascularization After Drug-Eluting Stent Implantation in Patients With Stable Coronary Artery Disease by Chunfeng Dai, Zhifeng Yao, Zhangwei Chen, Juying Qian and Junbo Ge in Angiology</p
Functional assessment of intracoronary Doppler: the Doppler Endpoints Balloon Angioplasty Trial Europe (DEBATE) study: preliminary results
No full textIntroduction The limitations of angiography have prompted inves tigators to use alternative methods for the functional assessment of angioplasty results. Various digital angiographic techniques and Doppler catheters were introduced and tested. However, only with the introduction of a Doppler angioplasty guide wire has the continuous measurement of blood flow velocity during a routine angioplasty procedure become possible. The main advantage of this system is the possibility of positioning the guide wire distal to the stenosis and reliably assessing the flow impairment induced by the stenosis under treatment. The veloc ity measurements can be repeated after angioplasty leaving the guide wire in place, distal to the stenosis, during dilatation. A normalization of flow veloc ity parameters after successful angioplasty will indicate that an adequate lumen enlargement has been achieved and a normal vascular conductance restored. The results of small-sized single-center studies have shown an improvement of the flow velocity indices in most cases after percutaneous transluminal coronary angioplasty (PTCA). Up to now, however, no appropriately sized prospective studies have assessed the value of flow velocity indices in predicting immediate complications and recurrence of symptoms after PTCA
Transcatheter aortic valve replacement: Team construction and operation specifications recommended by Chinese experts
No full text
Ge1-ySny (y=0.01-0.10) alloys on Ge-buffered Si: Synthesis, microstructure, and optical properties
No full textabstract: Novel hydride chemistries are employed to deposit light-emitting Ge [subscript 1- y] Sn [subscript y] alloys with y ≤ 0.1 by Ultra-High Vacuum Chemical Vapor Deposition (UHV-CVD) on Ge-buffered Si wafers. The properties of the resultant materials are systematically compared with similar alloys grown directly on Si wafers. The fundamental difference between the two systems is a fivefold (and higher) decrease in lattice mismatch between film and virtual substrate, allowing direct integration of bulk-like crystals with planar surfaces and relatively low dislocation densities. For y ≤ 0.06, the CVD precursors used were digermane Ge [subscript 2]H[subscript 6] and deuterated stannane SnD[subscript 4]. For y ≥ 0.06, the Ge precursor was changed to trigermane Ge [subscript 3]H[subscript 8], whose higher reactivity enabled the fabrication of supersaturated samples with the target film parameters. In all cases, the Ge wafers were produced using tetragermane Ge [subscript 4]H[subscript 10] as the Ge source. The photoluminescence intensity from Ge [subscript 1− y] Sn [subscript y] /Ge films is expected to increase relative to Ge [subscript 1− y] Sn [subscript y] /Si due to the less defected interface with the virtual substrate. However, while Ge [subscript 1− y] Sn [subscript y] /Si films are largely relaxed, a significant amount of compressive strain may be present in the Ge [subscript 1− y] Sn [subscript y] /Ge case. This compressive strain can reduce the emission intensity by increasing the separation between the direct and indirect edges. In this context, it is shown here that the proposed CVD approach to Ge [subscript 1− y] Sn [subscript y] /Ge makes it possible to approach film thicknesses of about 1 μm, for which the strain is mostly relaxed and the photoluminescence intensity increases by one order of magnitude relative to Ge [subscript 1− y] Sn [subscript y] /Si films. The observed strain relaxation is shown to be consistent with predictions from strain-relaxation models first developed for the Si[subscript 1− x] Ge [subscript x] /Si system. The defect structure and atomic distributions in the films are studied in detail using advanced electron-microscopy techniques, including aberration corrected STEM imaging and EELS mapping of the average diamond–cubic lattice.Copyright 2014 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. along with the following message: The following article appeared in 116, 13 (2014) and may be found at http://dx.doi.org/10.1063/1.489678
Atomic layer deposition of crystalline SrHfO3 directly on Ge (001) for high-k dielectric applications
No full textabstract: The current work explores the crystalline perovskite oxide, strontium hafnate, as a potential high-k gate dielectric for Ge-based transistors. SrHfO3 (SHO) is grown directly on Ge by atomic layer deposition and becomes crystalline with epitaxial registry after post-deposition vacuum annealing at ∼700 °C for 5 min. The 2 × 1 reconstructed, clean Ge (001) surface is a necessary template to achieve crystalline films upon annealing. The SHO films exhibit excellent crystallinity, as shown by x-ray diffraction and transmission electron microscopy. The SHO films have favorable electronic properties for consideration as a high-k gate dielectric on Ge, with satisfactory band offsets (>2 eV), low leakage current (<10[superscript −5] A/cm[superscript 2] at an applied field of 1 MV/cm) at an equivalent oxide thickness of 1 nm, and a reasonable dielectric constant (k ∼ 18). The interface trap density (Dit ) is estimated to be as low as ∼2 × 10[superscript 12] cm[superscript −2] eV[superscript −1] under the current growth and anneal conditions. Some interfacial reaction is observed between SHO and Ge at temperatures above ∼650 °C, which may contribute to increased Dit value. This study confirms the potential for crystalline oxides grown directly on Ge by atomic layer deposition for advanced electronic applications.Copyright 2015 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. along with the following message: The following article appeared in JOURNAL OF APPLIED PHYSICS 117, 5 (2015) and may be found at http://dx.doi.org/10.1063/1.490695
OB00040 - Damodarpur Copper Plate 1 (GE 163) of Budhagupta
No full textDamodarpur Copper Plate 1 (GE 163) of Budhagupt
[[alternative]]Raman Study of Folded Acoustic Phonons in Si/Ge Superlattice
No full text[[abstract]]This research presents three Raman Spectrums of Si/Ge superlattices growing on the substrate of Si by MBE. The period of superlattice samples N=5, the growing conditions of superlattice are: the Si-layer is 50nm；the Ge-layers are 2.2nm、3.8nm and 5.4nm. Measuring by TEM of samples firstly, the Si-layers are 50.18nm、48.65 nm and 48.89 nm；the Ge-layers are 2.46 nm、3.78 nm and 4.44 nm。
In the Spectrum, the peak of Si-Si mode is quite obvious；The peak of Ge-Ge mode is comparatively weak. In the room temperature, the peak of Si-Ge mode is quite unobvious due to the fewer periods.
Raman Spectrum of three superlattices shows many and obvious folded phonon signals in the low frequency (0 ~100 cm-1) area , so does the doublets of phonon are quite obvious. Fittting the frequency of folded phonons by Rytov’s theory finds that the Si-layers are 49.65nm、45.98 nm and 45.95 nm, the Ge-layers are 2.12 nm、3.78 nm and 5.01 nm. All the errors are within 6%, so Rytov’s theory is a good foundation to study Raman Spectrum of superlattice.
Fitting the intensity of folded spectrum of phonon with photoelastic mode , in the wavelength far away the energy of resonance ( As 476 nm) can get good result. Also getting the ratio of Si-layer thickness and the period of superlattice are 0.96（632 nm）、0.93（476 nm）and 0.93（476 nm）, compared with the result of fitting frequency of folded phonon by Rytov’s theory：0.96、0.92及0.90, matchs very well, except the 3% difference of sample-N107.
Besides, examining Ge-Ge mode in the spectrum with LCM, the roughness of Ge-layer can be examed, and the calculating layers are 2.22nm、3.83 nm and 5.37 nm, the difference is within 7% comparing with the result of fitting phonons.
In the various temperature (10 K~300 K) Raman Sprctrum, there are signals of continuous scattering of phonons around 200 cm-1 , and the lower the temperature, or the thinner the Ge-layer, the more obvious the continuous scattering of phonon is. We can find the phenomenon that E1 energy of Ge-layer is in the vicinity of 2.3 eV and distributed widely ,when we observe the folded phonon in low frequency, the resonance of Ge-Ge Mode, and the fluorescence in high frequency.
- …
