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CMOS-MEMS Technology and Its Application to Micromirror Devices
No full text本文討論以晶圓代工方式進行微機電系統(MEMS)裝置的研究方法，並以兩種不同型式之微型鏡面元件作為測試平台進行CMOS-MEMS裝置的設計和製程可行性驗證。與積體電路相容之微機電技術(CMOS-MEMS)提供一種極為彈性且頗具發展潛力的整合製作方法。其採用既有的標準化半導體製程(CMOS process)可將微電子電路以及微機電微細結構透過相同的設計和驗證介面整合在一個晶片之上。然而，由於積體電路製程程序、電路元件模型和各層材料的特性等在晶圓廠便已調校固定，因而在利用代工製程製作微機電裝置的同時便需要針對微裝置的微細結構以及力學特性做一深度的考量和計算。例如必須額外注意製程的相容性以及經過後製程(post-process)之後裝置的可測試性和未來發展的可行性等等。本文將於第三章和第四章以兩個章節分別說明CMOS-MEMS的設計實務和未來發展狀況；首先，以「CMOS-MEMS整合技術」為主軸做一精簡的說明，同時以一微型光學元件為例，說明實際的設計和製程工作，並探討其中所衍生的相關問題。之後再以「微系統設計平台的建置」為主題來說明如何建置一具有統合電子電路和微機電系統裝置之完整設計平台；此設計平台不僅可利用現有的積體電路設計軟體同時進行電路和微結構的設計工作，最後更可依據IC或是MEMS晶圓廠所提供的設計規範進行同步的光罩驗證和除錯，以得到最貼近實際且符合製程規範的最後成果。微機電技術的發展承襲了電子電路早期的研發模式，在單一零組件或是分立次系統之上已獲得可靠且具潛力的發展遠景，因而未來的發展除了拓展民生工業應用之外，亦需逐步建立一套彈性且高效能的整合設計環境，以便加速設計製作流程、降低研發成本和提高產品的可靠度。
本文並以台積電0.35μm製程為例實際製作一微型光學鏡面裝置，並說明其設計與製程所需注意之事項。誌謝……………………………………………………………………….i
摘要………………………………………………...…………………….1
Abstract…………………………………….……..………………………3
目錄…………………………………………….………………………...4
圖目錄……………………………………………………………..……..7
表目錄……………………………………………………..….………...10
第一章 緒論………………………………………………..…………..11
1.1 研究動機.……………..……………………………..……..11
1.2 論文架構.……………..……………………………..……..14
第二章 CMOS-MEMS整合技術簡介與設計考量...............................16
2.1 微機電系統之發展………………………………………...16
2.1.1 體型微加工……………………………..…………..…17
2.1.2 面型微加工…………………………..……………..…17
2.1.3 非傳統半導體製程方法…………..…………………..18
2.1.4 其他之微機電裝置製造方法……..……...…….……..19
2.1.4.1 SOI (silicon-on-insulator)….…….…..….………19
2.1.4.2 高分子材料或聚合物….……..……..…………19
2.1.4.3 CMOS-MEMS (CMOS-Compatible MEMS)…..20
2.2 CMOS-MEMS的發展歷程與製程分類……..………..…….21
2.2.1 單純CMOS製程……………….……..………..… ….22
2.2.2 CMOS前製程處理程序……………………..….… ….22
2.2.3 CMOS中間製程處理程序…………………..….… ….24
2.2.4 CMOS後製程處理程序…………………….…………25
2.2.4.1 post-CMOS薄膜沉積後製程…………….…….25
2.2.4.2 post-CMOS體型或表面微加工後製程………..26
2.3 CMOS-MEMS的應用與未來展望……………………..….28
笫三章 IC-MEMS整合設計平台之建立與應用……………………..33
3.1 簡介………………………………………………………...33
3.1.1 微機電設計環境及製程驗證資料之建立…………..33
3.1.2 參數化的元件設計…………………….…………….36
3.1.3 系統層級設計的概念………………………………..38
3.2 製程代工體系的整合運用…..…………………………….39
3.3 電腦輔助微機電系統設計的未來發展…………………...40
笫四章 CMOS微光學鏡面裝置之設計、製作及量測…..…………..50
4.1 微機電技術及其在光學上的應用…………. .….………...50
4.2 相關文獻回顧……………………………………...……....52
4.3 CMOS光學微鏡面裝置之設計、製程與量測..…………..53
4.3.1 圓形微鏡面之設計….………………………….…....54
4.3.1.1 設計流程.….……..……..…………………...55
4.3.1.2 模擬與分析………………………….……....56
4.3.1.3 後製程與量測結果………………..….……..57
4.3.2 矩形微鏡面之設計….……………………..………...61
4.3.2.1 結構與電路模擬..……..………..….………..62
4.3.2.2 後製程結果與量測..………………...……....63
4.4 CMOS-MEMS之製程相容性討論…………..……..….......66
4.4.1標準化的製程程序和固定的薄膜材質…………….66
4.4.2標準化的設計規範和元件模型…………………….67
4.4.3 結構和力學上的考量………………………..……..67
笫五章 結論與未來展望………………………………………………92
5.1 結論……………………..………………….………………92
5.2 未來展望…….………………………………….……….....94
參考文獻…………………………………………………….………….9
A MEMS micromirror fabricated using CMOS post-process
No full textThis work describes the fabrication of a micromachined micromirror by the conventional 0.35m CMOS process and a simple maskless
post-CMOS process. The micromirror contains a rectangular mirror plate and four pairs of serpentine supported beams, is integrated with
a 1×4 demultiplexer and a four-stage charge pump circuits on a chip. Maskless dry and wet etching processes are the only requirement
to suspend the structure. The primary limitation in the fabrication of microstructures has been overcome by the development of a hybrid
processing technique, which combines both an anisotropic dry etch and an isotropic wet etch step. A highly reliable wet etching step with
high selectivity between aluminum and sacrificial oxide is also reported. Experimental results reveal that the micromirror has a tilting angle
of around 5◦ at operation voltage of 22.5V and a dynamic response less than 5 ms. The surface properties of the CMOS micromirror, detailed
process flows, measurement set-up and the experimental results are also presented in this work
Going Beyond Counting First Authors in Author Co-citation Analysis
Get PDFThe present study examines one of the fundamental aspects of author co-citation analysis (ACA) - the way co-citation
counts are defined. Co-citation counting provides the data on which all subsequent statistical analyses and mappings
are based, and we compare ACA results based on two different types of co-citation counting - the traditional type that
only counts the first one among a cited work's authors on the one hand and a non-traditional type that takes into
account the first 5 authors of a cited work on the other hand. Results indicate that the picture produced through this non-traditional author co-citation counting contains more coherent author groups and is therefore considerably clearer. However, this picture represents fewer specialties in the research field being studied than that produced through the traditional first-author co-citation counting when the same number of top-ranked authors is selected and analyzed. Reasons for these effects are discussed
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