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環境変化で顕在化する基板界面近傍の高分子ナノ構造に関する中性子反射率法による研究
名古屋工業大学Nagoya Institute of Technology博士(工学)Doctor of Engineering主査:山本 勝宏doctoral thesi
Facing conflicts and contradictions: Introduction to the special section
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The dialogue in parenting support and child abuse prevention -- What does Open Dialogue bring? --
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The Other Side of an International Conference? - Excursions and Hospitality at the Third Pan- Pacific Science Congress 1926
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Applications of Hydrogen Silsesquioxane in Nanomanufacturing and Nanofabrication
Hydrogen silsesquioxane (HSQ) is a versatile inorganic material that has garnered significant attention in the semiconductor industry, such as in micro-/nano-electromechanical systems, photonic devices, and nanoelectronics, owing to its high silicon content, small molecular size, low dielectric constant, excellent line edge roughness, high etching resistance, and local planarization capabilities. This review article discusses the application-related aspects of HSQ in nanomanufacturing for integrated circuits and nanoscale patterning, and the technical applications of HSQ in the fabrication of semiconductor silicon-based nanomaterials.departmental bulletin pape
ポリマー分析のためのエレクトロスプレーイオン化-イオンモビリティ-質量分析法の高性能化
名古屋工業大学博士(工学)Doctor of Engineering主査:北川 慎也doctoral thesi