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Effect of carbon doping on the surface morphology of ITO films
No full textChanges in surface morphology of ITO films by carbon doping were investigated by co-sputtering of ITO and C targets. Surface roughness Ra of 0.5 nm before doping rapidly increased to reach a maximum of 3.0 nm at 0.12wt% C. With further increase in doped C up to 0.18wt%, Ra decreased to 0.5 nm almost equal to before doping. SEM observation in size and number of cones coexisting in ITO films. Resistivity of the films decreased from1.4 x 10-3 Ω/cm to 8.0 x 10-4 Ωcm by doping 0.002wt% carbon and then increased to 2.7 x 10-3 Ωcm at 0.182. These results revealed changes in surface roughness were caused by the growth mechanism of doped C. It was concluded that changes in surface morphology of ITO film by carbon doping can be estimated by difference in surface diffusion rate of atoms and molecules co-deposited on the substrate
Impact of Exclusion from Peer son One\u27s Future Outlook
No full text本研究では、中学校を卒業した直後の生徒約2,000人と、高校生約1,100人のデータを分析し、仲間はずれなどの社会的な排斥が将来展望に及ぼす影響などを検討した。中学校を卒業した直後の男子生徒のデータと、高校生のデータをそれぞれ分析した結果、社会的な排斥が、抑うつ傾向には正の影響を与え、将来展望には負の影響を与えることが示唆された。また、抑うつ傾向が将来展望に影響を与えないことを示唆する結果も得られた。しかし、中学校を卒業した直後の女子生徒のデータを分析した結果、社会的な排斥が抑うつ傾向に正の影響を与え、抑うつ傾向が将来展望に負の影響を与えることが示唆された。This study analyzed data from approximately 2,000 students recently graduated from junior high school and 1,100 high school students and examined the impact of social exclusion, such as being left out, on their future outlook. The analysis of data from male students (recently graduated from junior high school and studying currently in high school) and female high school students suggested that social exclusion has a positive impact on their tendency toward depression and a negative impact on their future outlook. In addition, results indicated that the depressive tendency has no impact on one\u27s future outlook. Furthermore, analysis of data from female students (recently graduated from junior high school) suggested that social exclusion has a positive impact on their tendency toward depression, which in turn negatively affects their future outlook
University-Shopping Street Cooperation toward Sustainable Urban Development: In search of a KACHIGAWA Style of decentralized autonomous shopping street - A case study of the Kachigawa Shopping Street -
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A Historical Research of Yoshio Toui\u27s “Mura wo Sodateru Gakuryoku<
No full text東井義雄『村を育てる学力』(1958年)の源泉は、彼が師範学校を卒業し20歳で豊岡市の豊岡小学校に着任して以降の6年間で、その大枠ができ上がり、その後豊岡小を去るまでの実践で一層精緻化された。新任から敗戦(1932～1945年)までの間に彼が実践した生活綴方的教育方法は、具体的には、「ひとり調べ-みんなで分かち合い・みがきあう-ひとり調べ」の学習サイクルである。別言すれば、子ども一人ひとりが各自の「生活の論理」に「教科の論理」をたぐり寄せながらそれぞれの「生活の論理」をみんなで太らせ合っていく学習方法である。Yoshio Toui (1912-1991) formed his fundamental concept of “Mura wo sodateru Gakuryoku< over six years in Toyooka primary school in Hyogo prefecture. Graduated from normal school, Toui was assigned Toyooka primary school at the age of 20. He refined his concept further through his practices in Toyooka primary school until Japan\u27s defeat in the World War II (1932-1945). His teaching method of Seikatsu Tuzurikata is the learning cycle of selfdriven research and sharing-and-refining by classmates. In other words, it is the method that individual child brings problems in the textbook (logic of the subject) closer to their everyday life (logic of everyday life), their own “logic of everyday life< and enriches it with other classmates
A Study on Syuhei Ishiyama and the Work
No full text本稿は、占領期に創刊された教育関係雑誌の中から、戦後、最も多く教育関係雑誌に執筆し、戦後新教育をリードした石山脩平に注目した。彼の足跡を振り返るとともに、石山が、戦前・戦後を通じていかなる著作をまとめ、教育関係雑誌にどのような論稿を発表したのかを整理し、石山脩平の果たした役割について考察した
Nights of a Month based on the Moon and its Manzils - A Traditional Daily Life of the Bedouin Cultures
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The Origins of American Public Arts Policy - Path toward Establishing the National Endowment for the Arts -
No full textDevelopment of high-quality graphene and transparent conducting film by microwave plasma CVD.
No full textマイクロ波表面波プラズマCVD 法で、環境に優しい原料ガス樟脳(Camphor)を使用して、銅箔上基板上に高品質グラフェンを成膜することができた。プラズマ照射中の紫外線カットにより高品質グラフェン膜の作製するためグラフェン成長中に置くチャンバー内にカバーを使用した。直接膜に当たらないようにすることで、紫外線の影響を防ぐことができ高品質なグラフェン(Id/Ig 比0.35)と透明導電膜(シート抵抗1.3kΩ/sq;透過率95.2%, @550nm)を成膜することができた