1,721,001 research outputs found
2D nano/micro hybrid patterning using soft/block copolymer lithography
No full textIn this work, we fabricated various 2D hybrid patterns with the feature resolution from micrometer to nanometer scale by using soft lithography and block copolymer lithography. Composite molds for the high-resolution with feature sizes from 135 nm to 50 mum were composed of a hard layer supported by soft PDMS layer. Polymer (PU) replica holes were made from the composite mold by replica molding. Block copolymers (PS-b-PMMA and PS-b-PI) were used as ink materials for the pattern smaller than 100 nm. UV and ozone etching was used for the selective removal of one block in the block copolymer. (C) 2003 Elsevier B.V. All rights reserved.This work was supported by the Brain Korea 21 program,
the IMT-2000 program and a grant (M102KN010001-
02K1401-00212) from Center for Nanoscale Mechatronics
and Manufacturing of 21st Century Frontier Research
Program
A HIGH SPEED DIRECT DIGITAL FREQUENCY SYNTHESIZER USING A LOW POWER PIPELINED PARALLEL ACCUMULATOR
No full textISCAS.2002This work was supported by KOSEF through the MICROS at KAIST, Korea
A 20 Gb/s 1 : 4 DEMUX without inductors and low-power divide-by-2 circuit in 0.13 mu m CMOS technology
No full textIn this paper, a 20 Gb/s 1:4 DEMUX without inductors is presented. A coupled latch with shared current source and buffer insertion scheme improves the signal bandwidth. A divide-by-2 circuit with a static frequency divider and a delay-locked loop achieves low power consumption and enhanced timing margin without the degradation of the divider sensitivity. A horizontal eye opening is 71.3%, and a vertical eye opening is 52%. The test chip fabricated in a 0.13 mu m process consumes 210 mW from 1.2 V logic supply
Colloidal lithographic nanopatterning via reactive ion etching
No full textWe report here a novel colloidal lithographic approach to the fabrication of nonspherical colloidal particle arrays with a long-range order by selective reactive ion etching (RIE) of multilayered spherical colloidal particles. First, layered colloidal crystals with different crystal structures (or orientations) were self-organized onto substrates. Then, during the RIE, the upper layer in the colloidal multilayer acted as a mask for the lower layer and the resulting anisotropic etching created nonspherical particle arrays and new patterns. The new patterns have shapes that are different from the original as a result of the relative shadowing of the RIE process by the top layer and the lower layers. The shape and size of the particles and patterns were dependent on the crystal orientation relative to the etchant flow, the number of colloidal layers, and the RIE conditions. The various colloidal patterns can be used as masks for two-dimensional (2-D) nanopatterns. In addition, the resulting nonspherical particles can be used as novel building blocks for colloidal photonic crystals.This work was supported by the Center
for Nanoscale Mechatronics and Manufacturing of the 21st
Century Frontier Research Program (M102KN010001-02K1401-
00212) and the National R&D Project for Nano Science and
Technology. The authors also acknowledge partial supports from
the Brain Korea 21 program, CUPS-ERC and the IMT-2000
Projects
Two-dimensional polymer nanopattern by using particle-assisted soft lithography
No full textThis work was supported by the
Center for Nanoscale Mechatronics and Manufacturing
of the 21st Century Frontier Research Program
(M102KN010001-02K1401-00212) and the National R&D
Project for Nano Science and Technology. The authors
also acknowledge partial support from the Brain Korea
21 program, CUPS-ERC, and the IMT-2000 Projects
Arrays of binary and ternary particles and their replica pores on patterned microchannels
No full textArrays of Binary and Ternary Particles and Their Replica Pores on Patterned Microchannels A novel method was developed for the assembly of patterned binary and ternary particle arrays and their inverted pore structures onto V-shaped microchannels that were fabricated by soft lithography. For the ternary particle arrays and their inverted pore structures, a dip-coating of binary particle mixture with a controlled size ratio and subsequent O(2) RIE were used.This work was supported by the
Brain Korea 21 Program, the CUPS-ERC, and a grant
(M102KN010001-02K1401-00212) from the Center for
Nanoscale Mechatronics & Manufacturing of the 21st
Century Frontier Research Program
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