49 research outputs found
Light extraction enhancement of bulk GaN light-emitting diode with hemisphere-cones-hybrid surface
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Light-extraction enhancement of freestanding GaN-based flip-chip light-emitting diodes using two-step roughening methods
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Fabrication of silicon nanotip arrays with high aspect ratio by cesium chloride self-assembly and dry etching
No full textNanotip arrays with high aspect ratio, which have attracted much attention due to their potential applications, have been fabricated by many methods. Dry etching combined with self-assembly masks is widely used because of the convenience of dry etching and high throughput of self-assembly. In this paper, we report a method combining Cesium Chloride (CsCl) self-assembly with inductively coupled plasma (ICP) dry etching to fabricate silicon nanotip arrays with high aspect ratio and silicon nanotip arrays with aspect ratio 15 have been achieved after optimization of all parameters
The application of multilayer elastic beam in MEMS safe and arming system
No full textIn this paper, a new approach for a multilayer elastic beam to provide a driving force and driving distance for a MEMS safe and arming system is presented. In particular this is applied where a monolayer elastic beam cannot provide adequate driving force and driving distance at the same time in limited space. Compared with thicker elastic beams, the bilayer elastic beam can provide twice the driving force of a monolayer beam to guarantee the MEMS safe and arming systems work reliably without decreasing the driving distance. In this paper, the theoretical analysis, numerical simulation and experimental verification of the multilayer elastic beam is presented. The numerical simulation and experimental results show that the bilayer elastic provides 1.8–2 times the driving force of a monolayer, and a method that improves driving force without reducing the driving distance
Analysis of nanometer-isolated trench diffract aerial image of both conventional and second-generation synchrotron-based proximity x-ray lithography
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Solidification of sulfur and arsenic in gold concentrate and leaching of the gold by thiosulfate
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