1,721,008 research outputs found
Monitoring of the plasma generated by a gas-puff target source
No full textA 10-Hz repetition rate, Nd:YAG pulsed laser (λ=1064 nm, pulse energy of 0.69 J, pulse duration of 3 ns) irradiated a Xe double-stream gas-puff target source. The interaction gives rise to the formation of plasma and emission of soft x-ray and extreme ultraviolet radiation. The produced plasma was investigated and characterized by a silicon carbide (SiC) and a commercial silicon (Si) detector, applying different spectral filters. Some parameters such as the plasma stability and its evolution (time trace profile and pulse time duration) are presented and discussed, evidencing pros and cons of the employment of SiC detectors with respect to the traditional Si for laser-generated plasma diagnostic
Characterization of Si and SiC detectors for laser-generated plasma monitoring in short wavelength range
No full textSilicon carbide detectors were employed to characterize the plasma produced by laser interaction with a double stream gas-puff target source. A 10 Hz repetition rate Nd:YAG laser (1064 nm wavelength, 0.69 J pulse energy and 3 ns pulse duration) was employed to irradiate different gas-puff targets (Argon, Xenon and Sulfur hexafluoride), at different pressures (1-10 bar), emitting plasma radiation in different wavelength ranges (ultraviolet, extreme ultraviolet and soft X-rays). The emission produced by the laser radiation was properly filtered (employing Titanium, Aluminium, Zirconium and Calcium fluoride filters), to narrow down the broad-band emission of the generated plasma. The SiC detectors' signals were compared with a calibrated traditional silicon detector evaluating their differences, i.e. taking into account the plasma stability, the time trace profile and the characteristics of the gas-puff target source. The obtained results, which will be presented and discussed, allow to improve the geometry and configuration of the SiC detectors avoiding saturation and charge recombination effects and getting a better proportionality to the energy and fluence of the detected radiations
Silicon carbide detectors for diagnostics of laser-produced plasmas
No full textRecently developed silicon carbide (SiC) detectors have been employed to study pulsed laser plasmas produced by irradiation of a double-stream gas puff target with nanosecond laser pulses. The plasma emitted by a gas-puff target source in the soft X-ray (SXR, λ = 0.1 - 10 nm) and extreme ultraviolet (EUV, λ = 10 - 120 nm) ranges was monitored with silicon carbide (SiC) detectors and compared with a commercial, calibrated silicon (Si) photodiode (AXUV-HS1). Different filters have been used to select the emission in different wavelength ranges from the broad-band emission of the plasma. This work shows the applicability of SiC detectors to measure the SXR and EUV ns pulses from the plasma, useful for monitoring and optimizing the gas-puff laser-plasma sources developed at IOE-MUT, in Warsaw (Poland). Some aspects relative to the plasma stability as well as characterization of the plasma source (i.e. the overall evaluation of the signal and the time trace profile) will be presented and discussed
SiC detectors for evaluation of laser–plasma dynamics employing gas-puff targets
No full textAn Nd:YAG pulsed laser was employed to irradiate different gas-puff targets. The interaction gives rise to the emission of soft X-ray (SXR), ultraviolet and extreme ultraviolet (EUV) radiation useful for X-ray microscopy. A Silicon Carbide (SiC) and a Si detector were employed to characterize the photon plasma emission of different gases in different wavelength ranges. The EUV and SXR measurements with different filters show the applicability of SiC detectors for plasma monitoring and characterization. Detector linearity, plasma evolution over the time and the relative intensity signal of both detectors will be presented and discussed
A desktop extreme ultraviolet microscope based on a compact laser-plasma light source
Get PDFA compact, desktop size microscope, based on laser-plasma source and equipped with reflective condenser and diffractive Fresnel zone plate objective, operating in the extreme ultraviolet (EUV) region at the wavelength of 13.8 nm, was developed. The microscope is capable of capturing magnified images of objects with 95-nm full-pitch spatial resolution (48 nm 25–75% KE) and exposure time as low as a few seconds, combining reasonable acquisition conditions with stand-alone desktop footprint. Such EUV microscope can be regarded as a complementary imaging tool to already existing, well-established ones. Details about the microscope, characterization, resolution estimation and real sample images are presented and discussed
Characterization and optimization of images acquired by a compact soft X-ray microscope based on a double stream gas-puff target source
No full textUsing a table-top size soft X-ray (SXR) microscope, based on a laser plasma source with a double stream gas-puff target and a Fresnel zone plate objective, series of images of test samples were acquired. Characterization and optimization of the acquisition parameters were studied and evaluated in terms of signal to noise ratio (SNR). Conclusions for the optimization of SXR imaging were reached. Similar SNR measurements might be performed to characterize other SXR imaging systems as well. Software enabling live calculation of the SNR during the image acquisition might be introduced in future in the compact imaging systems for optimal image acquisition or for benchmarking purposes
Soft X-ray microscope with nanometer spatial resolution and its applications
No full textA compact size microscope based on nitrogen double stream gas puff target soft X-ray source, which emits radiation in water-window spectral range at the wavelength of λ = 2.88 nm is presented. The microscope employs ellipsoidal grazing incidence condenser mirror for sample illumination and silicon nitride Fresnel zone plate objective for object magnification and imaging. The microscope is capable of capturing water-window images of objects with 60 nm spatial resolution and exposure time as low as a few seconds. Details about the microscopy system as well as some examples of different applications from various fields of science, are presented and discussed
Nanoscale imaging applications of soft X-ray microscope based on a gas-puff target source
Get PDFA compact microscope based on nitrogen double stream gas puff target soft X-ray source, which emits radiation in the water-window spectral range, at the wavelength of λ = 2.88 nm, is presented. The microscope, employing ellipsoidal grazing incidence condenser and a Fresnel zone plate objective, is capable of capturing images with a 60 nm spatial resolution and exposure time as low as a few seconds. Examples of different applications of the SXR microscopy, and its applicability for various fields of science, are presented and discussed
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