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Effects of growth parameters on the epitaxy of CoSi2//Si(100) formed by reactive deposition epitaxy
No full textGrain size and orientation in ternary Co1-xNixSi2 thin films on Si(100): Influence of the Ni content
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Grain size and orientation in ternary Co1-xNixSi2 thin films on Si(100): influence of the Ni content
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Self-organized ripple formation on nickel: Influence of initial surface morphology on the ripple pattern by ion beam sputtering
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