2 research outputs found
Real time investigation of the initial stages of a-C films growth
No full texta-C films were deposited by rf-PACVD. Their growth rate, thickness, density and roughness were derived during deposition from time dependent X-ray reflectivity (XRR) at a wavelength of 1.54 A and at a fixed incidence angle of 18. It is shown that the film density and surface roughness are not constant at the initial stages of growth. The density increases with increasing film thickness, while the surface roughness depends on the substrate roughness. The evolution of these parameters was measured also while etching the film in oxygen plasma and revealed the smoothing effect brought about by etching to the carbon surfac
Erbium-doped thin amorphous carbon films prepared by mixed CVD-sputtering
No full textCarbon possesses the unique property to get hybridized in two different forms: the sp2 and the sp3. Moreover, carbon easily bonds with hydrogen and other chemical elements to form carbon-based materials with different properties. Here, Er3+-doped amorphous hydrogenated carbon (a-C:H) films deposited via a mixed CVD magnetron sputtering process are studied. The deposition parameters are related to the physical and optical properties of the Er-doped carbon film
