254 research outputs found
Quantum Dot Single Electron Transistor Structure Formation Using E-Beam Lithography
No full textProf. Dr. Uda Hashim and his team won bronze at ITEX 2007, 18th - 20th May 2007 was held at Kuala Lumpur Convention Centre (KLCC), Kuala Lumpur.To achieve room temperature operation of single electron transistor (SET). To form single dot chanted for electron transport in SET via the Coufomb Blockade Oscillation (CBO) phenomenon
A cost effective and consummate fabrication teaching set up for microelectronic engineering undergraduate
No full textProf. Dr. Uda Hashim and his team won gold for A Cost Effective and Consummate Fabrication Teaching Set Up For Microelectronic Engineering Underaduate. ITEX 2005, 19th - 21st May 2005 was held at Putra World Trade Centre (PWTC), Kuala Lumpur.The package, which is fully designed and developed using KUKUM in-house expertise, is the first teaching laboratory that is purposely built for undergraduate microelectronic program in Malaysia
Silicon Nanowires
No full textProf. Dr. Uda Hashim and his team won gold at International Trade for Ideas - Inventions - New Products Exhibition (IENA 2007) organized by AFAG Messen & Ausstellungen GmbH was held at Nuremberg, Germany on 1st - 4th November 2007.Silicon Nanowires with diameter or width of the order of a nanometer or 10o meter and length of the order of microns propel for a novel research in the construction of atomically controlled periodic systems with reduced dimensionalities and effort towards developing "Nanotechnology"
MOS Transistor Mask Design Using SEM Based E-Beam Lithography
No full textProf. Dr. Uda Hashim and his team won silver for MOS Transistor Mask Design Using SEM Based E-Beam Lithography at ITEX 2006, 19th - 21st May 2006 at Kuala Lumpur Convention Centre (KLCC), Kuala Lumpur.Electron beam lithography (EBL) is one of the alternative tools in transferring micro and nano circuit patterns from design editor to the substrate. EBL is state-of-the-art technology for micro and even to nano feature size in direct writing technology. SEM based EBL will be used to define the mask for device fabrication. These masks were designed in GDSII Editor in EBL System. Poly-methyl-metacrylate (PMMA) is used as a resist in the EBL
Nanogap Dielectric Capacitor for Label Free Bio-Molecules Detection
No full textProf. Dr. Uda Hashim and his team won silver at 21st International Invention, Innovation and Technology Exhibition (ITEX) 2010, 14th - 16th May 2010 at Kuala Lumpur Convention Centre (KLCC), Kuala Lumpur, Malaysia.This research demonstrating that nanogap biosensor was fabricated by standard CMOS technologies function as extremely sensitive and selective biosensor for biomolecular detection and medical diagnostic application using label-free detection technique. The difference in dielectric properties between single-stranded DNA (ssDNA) and double-stranded DNA (dsDNA) permits use of capacitance measurements to detect DNA hybridization which is time saving and cost effective
Affordable and Effective Microelectronic Engineering Teaching Package for Undergraduate Programme
No full textProf. Dr. Uda Hashim and his team won silver at International Exhibition of Invention of Geneva 2006, 5th - 9th April 2006 was held at Palexpo, Geneva, Switzerland.The package, which is fully designed developed, using KUKUM in house expertise, is the first teaching laboratory that is purposely built for undergraduate microelectronic program in Malaysia
Silicon Nanowires
No full textProf. Uda Hashim and his team won gold for Silicon Nanowires. ITEX 2007, 18th - 20th May 2007 was held at Kuala Lumpur Convention Centre (KLCC), Kuala Lumpur.Silicon Nanowires is a new class of materials that have attracted attention and great research interest in the last few years because of their great potential applications in nanotechnology such as:
- nanoelectronic engineering
- nanomechanical engineering
- biomedical engineering
Fabrication of Silicon Nanowires is one of the great challenges today. Conventional lithography methods are not capable to produce Nanowires and even with advance nanolithography sizes below 100nm may not easily be achieved. The goal of this project is to form and produce very small Silicon Nanowires using a Top Down Nanofabrication Method which involved Scanning Electron Microscope (SEM) based Electron Beam Lithography (EBL) method
MOS Transistor (Fabricated Using In-House Low Cost Facilities)
No full textProf. Dr. Uda Hashim and his team won silver for MOS Transistor (Fabricated Using In-House Low Cost Facility) at ITEX 2006, 19th - 21st May 2006 at Kuala Lumpur Convention Centre (KLCC), Kuala Lumpur, Malaysia.MOS Transistor is divided into two types: NMOS and PMOS. Majority carrier od NMOS is electrons whereby PMOS is holes. The MOS transistor consists of three regions namely source, drain and gate. Fabrication of MOS transistor is done on 100mm silicon wafer. The active region of the transistor, which are source and drain are formed by either solid or liquid dopant. These transistors were fabricated using in-house low cost facility which is designed and developed by KUKUM internal expertise. The fabrication work is done in the cleanroom Class ISO 5 and ISO 6
Silicon Nanowires Based DNA Biosensor
No full textProf. Dr. Uda Hashim and his team won bronze at Malaysia Technology Expo 2010 (MTE 2010), 4th - 6th February 2010 at Putra World Trade Centre (PWTC), Kuala Lumpur. MTE 2010 organized by MARS and PROTEMP Exhibitions Sdn. Bhd.This research describes the fabrication of silicon nanowire for DNA hybridization detection in biosensor application. The SiNWs are fabricated by electron beam lithography and followed by deposition of contact metals. Aurum is a suitable metal to make Ohmic contact with SiNWs and its exhibit electrical transport measurements of the devices. The presence of the hybridization DNA will induce electronic charge and changed the electronic properties of the devices from which detectable electronic signals are generated
Semiconductor Nanowire
No full textProf. Dr. Uda dan ahli kumpulannya telah memenangi pingat perak di PECIPTA 2007 yang dianjurkan oleh Kementerian Pengajian Tinggi Malaysia (KPTM) dengan kerjasama Universiti Sains Malaysia (USM) pada 10 - 12 Ogos 2007 di Pusat Konvensyen Kuala Lumpur (KLCC), Kuala Lumpur.Semiconductor Nanowire represents an important and broad class of nanometer scale wire structure. Semiconductor Nanowire is a wire of dimension of the order of a nanometer or 10-9 meters. It is the one thousand times smaller than the width of the human hair and can carry information up to 100 times faster than similar component used in the current consumer electronic products. Semiconductor Nanowire with line-width of 20 nm is successfully fabricated at UNIMAP Microfabrication Cleanroom using Scanning Electron Microscope (SEM) based Electron Beam Lithography (EBL) technique
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