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Optical properties of Cobalt or Manganese alloying in iron disilicide (-FeSi2) thin films
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Development of transparent conductive ZnO by RF magnetron sputtering
No full textIn the present work it is reported a study on ZnO:Al deposited by RF magnetron sputtering of Zn and Al cathodes, or ZnO and Al cathodes in Ar+O2 and Ar atmosphere respectively. In order to obtain high band-gap films transparent in the 300 - 1000 nm wavelength region and highly electrical conductive films, an optimization of the deposition parameters has been performed by the Robust Design Method. ZnO:Al films, with an average transmittance above 85% for about 5000 angstroms thickness and a resistivity of 2 10-3 (Omega) cm have been grown
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