10 research outputs found
Impacts of fin width scaling on the electrical characteristics of 10-nm FinFET at different metal gate work function
No full textA study of the states kinetics in NBTI degradation by two-stage NBTI model implementation
No full text
Laser Anneal-Induced Effects on the NBTI Degradation of Advanced-Process 45nm high-k PMOS
Get PDFThis paper presents the effects imposed on the reliability of advanced-process CMOS
devices, specifically the NBTI degradation, subsequent to the integration of laser annealing (LA) in
the process flow of a 45nm HfO2/TiN gate stack PMOS device. The laser annealing temperatures
were varied from 900°C to 1350°C. The effects imposed on the NBTI degradation of the device were
comprehensively analyzed in which the shifts of the threshold voltage and drain current degradation were observed. The analysis was extended to the effects of the conventional RTA as opposed to the advanced laser annealing process. It was observed that the incorporation of laser annealing in the process flow of the device enhances the NBTI degradation rate of the device, in contrast to the
integration of the conventional RTA. Laser annealing subsequent to spike-anneal is observed to improve the reliability performance of the transistor at high negative biases
NBTI degradation effect on advanced-process 45 nm high-k PMOSFETs with geometric and process.
Get PDFNegative bias temperature instability (NBTI) has become an important reliability concern for nano-scaled complementary metal oxide (CMOS) devices. This paper presents the effect of NBTI for a 45 nmadvanced process high-k dielectric with metal gate PMOS transistor. The device had incorporated advanced-process flow steps such as stress engineering and laser annealing in order to achieve high on-state drain current drive performance. To explore NBTI effects on an advanced-process sub-micron device, the 45 nm high-k PMOS transistor was simulated extensively with a wide range of geometric and process variations. The device was simulated at varying thicknesses in the dielectric layer, oxide interfacial layer, metal gate and polysilicon layer. In order to observe the NBTI effect on process variation, the NBTI degradation of the 45 nm advanced-process PMOS is compared with a 45 nm PMOS device which does not employ process-induced stress and incorporates the conventional rapid thermal annealing (RTA) as compared to the laser annealing process which is integrated in the advanced-process device flow. The simulation results show increasing degradation trend in terms of the drain current and threshold voltage shift when the thicknesses of the dielectric layer, oxide layer as well as the metal gate are increased
Comparison of DC and pulse train analysis on submicrometer pMOSFETs lifetime prediction using on-the-fly method
No full textMapping the field of microbial fuel cell: A quantitative literature review (1970–2020)
Get PDFMicrobial fuel cell (MFC) has received much attention in the last decade as a promising technology to simultaneously generate electricity and decontaminate wastewater. This study aims to quantitatively review the published literature on MFC, published in the period of 1970–2020, based on the Web of Science (WoS) database. For the first time in literature, a comprehensive quantitative review of MFC has been conducted by employing the technique of bibliometric and content analyses. A total of 11,397 publications have been retrieved from WoS, out of which 81.6% are research articles. The evaluation in the field of MFC has been mapped in various categories, such as publication history, publication distribution, subject category distribution, leading journals, leading countries and leading organizations in MFC research. Additionally, content analysis has been conducted to unearth the research trends in MFC; and some hot research topics in MFC have been spotted. Results depict that the period 2011–2020 has been the most appreciating era for MFC research, as it contributed 87% of the total publications. Among the subject categories, energy fuel and microbiology lead with contributions of 26.5% for each, butthe overall growth of the energy fuel category in the last decade has been the highest. Out of 1,147 journals publishing MFC research, Bioresource Technology is the leading one; and countries like China, USA and India are the main hub of MFC research with 26.47%, 16.95% and 7.69% contributions in publications, respectively. The hottest topics in MFC research are nanoparticles, catalysts, air electrodes, graphene electrodes, power enhancement, air cathode and nitrogen removal. Moreover, major research areas are engineering, energy fuels and biotechnology with each contribution 26.5% of the total publications
Negative bias temperature instability characterization and lifetime evaluations of submicron pMOSFET
No full textA major effect of different measurement delay in
seconds is revealed through quasi DC Stress Measure Stress
experiments. We found that different delay of measurements in
seconds contributed to different stress time needed to achieve
target 10% degradation of Vth. The longer delay, the more time
needed for the device to achieve 10% degradation of Vth. The effect
on NBTI degradation is shown to be reliant on stress conditions
(stress voltage, temperature) and device architecture (gate
dimensions, gate oxide thickness). The NBTI lifetime was
predicted by extrapolating lifetime to the nominal operating
voltage from Time-to-Fail versus stress bias and oxide electric field
plots. Both plots show that the lifetime of degradation parameter
of Vth is lower compared to the lifetime of degradation parameter
of Idsat
Proceedings of International Technical Postgraduate Conference 2022
Get PDFThis conference proceedings contains articles on the various research ideas of the academic & research communities presented at the International Technical Postgraduate Conference 2022 (TECH POST 2022) that was held at Universiti Malaya, Kuala Lumpur, Malaysia on 24-25 September 2022. TECH POST 2022 was organized by the Faculty of Engineering, Universiti Malaya. The theme of the conference is “Embracing Innovative Engineering Technologies Towards a Sustainable Future”. TECH POST 2022 conference is intended to foster the dissemination of state-of-the-art research from five main disciplines of Engineering: Electrical Engineering, Biomedical Engineering, Civil Engineering, Mechanical Engineering, and Chemical Engineering. The objectives of TECH POST 2022 are to bring together innovative researchers from all engineering disciplines to a common forum, promote R&D activities in Engineering, and promote the dissemination of scientific knowledge and research know-how between researchers, engineers, and students.
Conference Title: International Technical Postgraduate Conference 2022Conference Acronym: TECH POST 2022Conference Date: 24-25 September 2022Conference Location: Faculty of Engineering, Universiti Malaya, Kuala Lumpur Malaysia (Hybrid Mode)Conference Organizers: Faculty of Engineering, Universiti Malaya, Kuala Lumpur, Malaysia
