33 research outputs found

    Thomas Kyd, The Householder's Philosophy, ed. Domenico Lovascio

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    This is a modern-spelling critical edition of Thomas Kyd's The Householder’s Philosophy (1588), the first complete English translation of a work by Torquato Tasso, namely Il padre di famiglia (1582). It supersedes the previous critical edition by Frederick S. Boas in The Works of Thomas Kyd (Oxford: Clarendon Press, 1901). It offers new insights into Kyd's work and intellectual life, also providing a fairer reappraisal of his translation over a 120 years after Boas's edition

    VII Shakespeare

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    This chapter has three sections: 1. Editions and Textual Studies; 2. Shakespeare in the Theatre; 3. Criticism. Section 1 is by Brett Greatley- Hirsch; section 2 is by Peter J. Smith; section 3(a) is by Elisabetta Tarantino; section 3(b) is by Domenico Lovascio; section 3(c) is by Shirley Bell; section 3(d) is by Christian Griffiths; section 3(e) is by Kate Wilkinson; section 3(f) is by Sheilagh Ilona O’Brien; section 3(g) is by Louise Powell

    Effects of the coating on S-band microstrip filter performance

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    In the past years, the conformal coating on the printed circuit board has been widely used because it offers several advantages in terms of protection and reliability of electronic circuits. However, the coating is a dielectric material, which can impact on the performance of radio-frequency components such as microstrip filters. Hence, the coating characterisation from the dielectric point of view is essential in order to design filters that meet prefixed requirements. Although the dielectric properties of commercial conformal coatings are well known, specific analyses on the effect of the coating on devices performance for space applications are not present in the literature and the coating manufactures do not often provide an appropriate characterisation of dielectric properties, making the analysis and the design of the microstrip filters difficult. The authors discuss numerical and experimental results regarding the performance of a coupled microstrip filter and show that the presence of CV-1152 coating causes a significant shift of the S-parameters. Moreover, a new configuration of the filter based on a fractal shape is proposed, which is characterised by more compact size and an optimised bandwidth

    Insights into the Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition of Thin Films from Methyldisiloxane Precursors

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    This work describes the plasma-enhanced chemical vapor deposition of thin films at atmospheric pressure using dielectric barrier discharges fed with argon, oxygen and different methyldisiloxanes, i.e., hexamethyldisiloxane, pentamethyldisiloxane, and 1,1,3,3-tetramethyldisiloxane. The influence of the methyldisiloxane chemical structure and of the oxygen/methyldisiloxane feed ratio is investigated in order to provide insights into the organosilicon plasma chemistry at atmospheric pressure. As expected the FT-IR and XPS analyses show that the carbon content of the coatings depends on the number of methyl groups in the precursor molecule; in the case of coatings obtained with PMDSO and TMDSO carbon removal seems to be further enhanced by the presence of Si-H bonds. Gaschromatography-mass spectrometry analyses of the exhaust gas allow to assess the precursor depletion and to perform the quali-quantitative determination of by-products (e.g., silanes, siloxanes, silanols) formed by plasma activation. The results are exploited to rise hypotheses on the contribution of the different reaction pathways on the deposition mechanism

    Colloidal monolayers combined with cold plasmas: a versatile nanofabrication tool

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    New challenges of life science research make nanostructured polymeric surfaces, chemically and spatially resolved, very attractive for biomedical purposes. High costs and unsuitability of polymers processed by the traditional techniques lead to new research routes. In this work, the production of nanostructured polystyrene substrates combining Colloidal lithography and cold plasma processes is shown. Colloidal nanoparticles self-assemble into a regular lattice on the polymers, and are used as physical masks in lithographic processes. Ammonia plasma treatments have been used to improve the suitability of the polymer surface for the entire process. Plasma etching with Ar/O(2) discharges have been applied to transfer the patterns
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