53 research outputs found
Stroke volume index assessment using two minimal invasive devices during hemodynamic postoperative optimization
No full textNON-INVASIVE SVI AND CI MEASUREMENT OBTAINED WITH TTE vs TRANSPULMONARY THERMODILUTION TECHNIQUE: A CONCORDANCE STUDY
No full textAnalysis of PaO2/FiO2 as an early predictor of postoperative complications after esophagectomy
No full textTiming and adequacy of intrapartum antibiotic prophylaxis: new insights for future guidelines
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An 84-year-old woman with shortness of breath and low oxygen saturation: “think outside the box”
No full textAn 84-year-old woman, who had been admitted to the emergency department (ED) several times because of dyspnoea, was treated for acute exacerbation of chronic respiratory failure without satisfactory clinical improvement. According to her medical history, 8 years earlier, she underwent a complicated cardiosurgical procedure that required tracheostomy and mechanical ventilation in the post-operative period for 45 days. Traditional X-Ray did not show any abnormal findings; however, high resolution thorax computed tomography (HRCT) scan revealed a severe tracheal stenosis, which was confirmed with bronchoscopy, and required immediate tracheostomy. Tracheal stenosis is a rare but severe complication that should be suspected when a patient with previous tracheostomy presents to the ED with dyspnoea even if tracheostomy had been closed many years before, because adaptive mechanism results in asymptomatic life for a long period
Design and development of group 13 precursors for improved vapour deposition of metal nitride thin films
No full textAtomic layer deposition (ALD) and chemical vapour deposition (CVD) are important techniques to deposit thin films for a variety of applications. Metal oxides and nitrides are used as passivation layers and as dielectrics, and due to the increasingly small sizes of microelectronic devices, their depositions must be precise, conformal, and of high purity. This work examines how precursor design can reduce impurities in deposited films. Several novel precursors have been designed, synthesized, and characterized, and used to deposit a variety of group 13 nitride thin films. Bidentate ligands such as guanidinates, NacNacs and azenides have been explored, as have simpler ligand systems such as amides and hydrides. The importance of precursor design is emphasized due to the fact that it enables the development of new, volatile, and thermally stable compounds and ALD processes that will deposit pure, high-quality films in a cost- and time-efficient manner
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