205,655 research outputs found
Mask Wearing Behavior, Type of Mask, Frequency Replacement of Mask, and Duration of Mask Wearing with Skindemic
No full textOne of the health protocols to prevent the occurrence of being infected with the coronavirus is using a mask. The use of masks can be a skin disorder, one of which triggers the emergence of a skin epidemic, especially if you don’t pay attention to cleanliness, especially on facial skin. The purpose of the study was to determine the mask-wearing behavior, type of mask, frequency of replacement of mask, and duration of mask-wearing with skindemic. This research is an analytical study of Rank Spearmen with the cross-sectional method. The sample used was 5400 respondents using the total sampling technique. The data was obtained by giving a questionnaire with google form to the respondents. Data were collected and then analyzed using SPSS. The results of the research on the behavior of mask-wearing with skindemic (p=0.000). The behavior of the use of this type of mask with the incidence of skindemic (p=0.001). Frequency replacement of mask with skindemic (p=0.001). the duration of mask-wearing on skindemic (p=0.003). Mask-wearing behavior, type of mask, frequency replacement of mask, and duration of mask-wearing with skindemic. It is necessary to keep the facial clean and replace masks regularly to prevent facial irritation, especially skindemic
Efficient simulation of three-dimensional EUV masks for rigorous source mask optimization and mask induced imaging artifact analysis
No full textPaper 75450DIn this paper a rigorous three dimensional EUV mask simulation model is presented. The mask near field is simulated with the Waveguide method which is similar to the RCWA approach. Additionally the method is extended by a so called decompositions technique. The mask image is computed by coupling the Waveguide method with a fully vectorial imaging simulation model based on an extended Abbe approach. The basic theory of the models is explained. The optimization and combination of both simulation approaches enables the simulation and analysis of larger EUV mask areas required for the analysis of complex three dimensional EUV mask structures as well as the very fast simulation of standard sized EUV mask areas required in the context of source mask optimizations. Corresponding simulation examp les like a rigorous source mask optimization and a mask induced imaging artifact analysis of a larger mask area demonstrate the capabilities and the performance of the new simulation system
Masks and metamorphosis
No full textThe purpose of this study is to consider the uses of the mask in ritual and theatre, and in particular the reputed influence of the mask over the wearer, and the experiences of 'trance' and 'possession' reported by anthropologists and mask practitioners and performers. The study also examines the role of the maker in creating a powerful tool for ritual and performance, and the comparatively rare phenomenon of the mask-maker who creates a mask which he or she will subsequently wear and the potential paradox of the maker 'possessed' by the object he has made. The first chapter focuses on the mask in its practical and ritualistic contexts in many cultures, and the second considers the concept of mask and transformation in ritual and theatre. The third describes a number of approaches to the use of mask in contemporary drama, in both the creation and performance of theatre. Chapter Four further investigates the effects of the mask on wearer and audience, and attempts to account for some of the experiences described by wearers. The fifth chapter examines the role of the mask maker in ritual and theatre, the relationship between mask and maker, and the maker as wearer. The sixth chapter centres on children as makers and wearers of masks, and focuses on primary school mask making and performance projects. The final chapter explores the relationship of the mask and the self, the assumed and the actual identities of the masquerader. Appendices I-XIV describe the experiences of mask makers and wearers in a variety of contexts, and provide additional evidence of the unusual sensations experienced by wearers. The thesis aims to investigate some of the causes of these phenomena and to consider strategies adopted by practitioners, directors and dramatherapists for utilising these heightened experiences to positive effect in performance
An empirical and theoretical investigation into the psychological effects of wearing a mask
No full textA review of the literature shows that the wearing of a mask has been hypothesised to bring about four main psychological effects: disinhibition, transformation, facilitation of the expression of aspects of the wearer’s Self, and various psycho-somatic changes. Several different explanations have been proposed as to why each of these effects come about. Using theoretical and empirical research, the thesis explores in detail the hypothesis that a mask can disinhibit its wearer, and that this disinhibition comes about because the mask-wearer feels less identifiable. The findings show that a mask can significantly reduces its wearer’s feelings of identifiability, and that it can also significantly reduce its wearer’s public self-awareness as a consequence of changes in attentional focus. However, the empirical evidence suggests that the mask’s disinhibiting effect is limited to situations in which an individual wants to behave in a particular way, but inhibits that behaviour out of a concern with ‘mask-able’ facets of their public self. Concomitantly, the findings suggest that, if an individual wants to behave in a way for which they require ‘mask-able’ facets of the public self, then the wearing of a mask may be experienced as inhibiting. This thesis also examines the hypothesis that a mask can transform its wearer, and that this occurs through the self-attribution process outlined by Kellerman and Laird (1982). The thesis provides strong empirical support for both these hypotheses, showing that the wearing of a mask can make individuals feel less like their usual self and more like the character represented in the mask. However, the empirical evidence suggests that this latter effect only occurs under conditions in which an individual is specifically focused on their masked appearance. A final chapter discusses the theoretical and applied implications of these findings, with specific reference to the use of masks in therapeutic practice
From MASK knowledge management methodology to learning activities described with IMS - LD
No full textIn this paper we present how knowledge capitalized using the Knowledge Management Mask methodology can be used to design E-learning activities by matching Mask models and the concepts proposed by the IMS-Learning Design modelling language. Our study consists in highlighting the e-learning aspects encapsulated in these MASK models carried out around a domain of activity, via a writing these elements in the description language IMS - Learning Design, in a preoccupation of reusability and reengineering.Knowledge Management, E-learning
Comparison of Haemodynamic Responses to Laryngeal Mask Airway Insertion and Laryngoscopy with Endotracheal Intubation in Adults Undergoing Elective Surgery at Muhimbili
No full textAirway management is of utmost importance during delivery of general anaesthesia. Traditionally, laryngoscopy and endotracheal tube (ETT) insertion has been the mainstay in providing adequate airway management and delivering anaesthesia. The laryngeal mask airway (LMA) offers a much less invasive way of maintaining the airway as it does not pass through the glottis but is placed over the glottis. It does not require the use of the laryngoscope. Laryngoscopy and tracheal intubation or laryngeal mask airway insertion are noxious stimuli which provoke a transient but marked sympathetic response manifesting as hypertension and tachycardia. In susceptible patients particularly those with systemic hypertension, coronary heart disease, cerebrovascular disease and intracranial aneurysm, even these transient changes can result in potentially deleterious effects like left ventricular failure, arrhythmias, myocardial ischaemia, cerebral haemorrhage and rupture of cerebral aneurysm. To determine the haemodynamic response elicited by laryngoscopy and endotracheal intubation and compare it with that elicited by laryngeal mask insertion in ASA I and ASA II patients, undergoing elective surgeries at Muhimbili national Hospital (MNH) and Muhimbili Orthopaedic Institute (MOI) in 2011. A hospital based prospective randomized comparative study was conducted to determine the haemodynamic response elicited by laryngoscopy and endotracheal intubation and compare it with that elicited by laryngeal mask insertion in ASA I and ASA II patients, undergoing elective surgeries at MNH and MOI . After induction of anaesthesia either an ETT or LMA was inserted. Evaluations included measurement of blood pressure and heart rates before insertion, after insertion of device, 1 minute, 3 minutes and 5 minutes after insertion. Measuments were taken from the Drager infinity gamma XL monitor. Time and ease of insertion was also noted.Results There was an increase in HR, SBP and DBP seen after laryngoscopy and ETT insertion as well as after laryngeal mask insertion. The change in haemodynamic parameters after laryngoscopy and ETT insertion were significantly greater than those elicited by LMA insertion (p<0.0001). The increase took about 5 minutes to return to pre insertion values in the ETT group, while it took about 3 minutes for the same values to return to pre insertion values in the LMA group. It took a significantly shorter time to insert an LMA (12.63 sec) as compared to time taken to insert an ETT (22.76 sec). Insertion of an LMA was rated easy in 84% of the patients while it was rated easy in 60% of the ETT patients. The haemodynamic changes elicited by LMA insertion are less and short lived compared to those elicited by laryngoscopy and ETT insertion. It takes a shorter time and is much easier to insert an LMA as compared to laryngoscopy and ETT insertion. These changes might be insignificant in a normotensive patient, but could be harmful in a patient with cerebrovascular or cardiovascular abnormalities. The use of an LMA is recommended in these groups of patient
Fast rigorous simulation of mask diffraction using the waveguide method with parallelized decomposition technique
No full textPaper 679206A new and optimized electromagnetic field (EMF) solver based on the waveguide method with a decomposition technique for rigorous optical and extreme ultraviolet (EUV) mask near field simulations is presented. The implemented software algorithm enables full three dimensional (full 3D) mask simulations as well as three dimensional mask simulations based on a parallelized decomposition technique (Q3D, Q stands for quasi). After a short introduction to the waveguide method and to an optimized mask description, the basis of a decomposition technique and its parallelization are presented. Subsequently the capabilities of the new electromagnetic field solver are demonstrated by the simulations of advanced optical and EUV imaging problems. Simulations of larger sized mask areas and of standard sized defective EUV mask areas using the decomposition technique are shown. Finally, a further reduction of computation time using parallelization is demonstrated
Mask absorber development to enable next-generation EUVL
No full textArt.111780F, 7 S.In next-generation EUV imaging for foundry N5 dimensions and beyond, inherent pitch- and orientation-dependent effects on wafer level will consume a significant part of the lithography budget using the current Ta-based mask. Mask absorber optimization can mitigate these so-called mask 3D effects [1-3]. Last year at the SPIE Photomask and EUVL conference [4,5], EUV mask absorber change is recognized by the community as key enabler of next-generation EUV lithography. Through rigorous lithographic simulations we have identified regions, based on the material optical properties and their gain in imaging performance compared to the reference Ta-based absorber [6]. In addition, we have established a mask absorber requirement test flow to validate the candidate material to the full mask supply chain. In this paper we discuss in more detail Te- and Ru- based alloys which cover these different improvement regions. Candidate materials are evaluated on film morphology, stability during combined hydrogen and EUV loading, and thermal and chemical durability. The EUV optical constants are measured by EUV reflectometry, and preliminary results of plasma etching are shown to enable patterning
Optimization of mask absorber stacks and illumination settings for contact hole imaging
No full textPaper 70283LThis paper reports on the mutual optimization of the mask geometry, mask absorber stack, and illumination settings for arrays of non-quadratic contact holes with different pitches. In contrast to previous work in this field, mask topography effects are fully taken into account. The proposed procedure is enabled by significant performance improvements implemented in the rigorous Waveguide EMF solver and by the application of global optimization techniques. In order to allow for a flexible and efficient interaction, all models and algorithms have been integrated into the Fraunhofer IISB development and research lithography simulation environment Dr.LiTHO. To demonstrate the flexibility of our optimization approaches, we have optimized the imaging of dense and semi-dense arrays of 65nm×90nm c ontact holes with a 1.35NA water immersion ArF scanner. The process performance is evaluated in terms of overlapping process windows of all relevant feature sizes
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