7,554 research outputs found
The thermal decomposition of diazirines: 3-(3-methyldiazirin-3-yl)propan-1-ol and 3-(3-methyldiazirin-3-yl)propanoic acid
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Comparison of microdebrider-assisted inferior turbinoplasty and submucosal resection for children with hypertrrophic inferior turbinates
No full textDopamine-induced apoptosis in human melanocytes involves generation of reactive oxygen species
No full textSynthesis and characterization of fluorinated beta-ketoiminate and imino-alcoholate Pd complexes: precursors for palladium chemical vapor deposition
Full text link[[abstract]]The design and synthesis of Pd complexes with two beta-ketoiminate or with two imino-alcoholate chelate ligands is reported. In order to establish their structures in the solid-state, methoxyethyl substituted complexes 1c and 2c were characterized by single crystal X-ray diffraction, showing a square-planar local coordination for the Pd atom, but the beta-ketoiminate ligands of 1c gave a bent basal plane involving two chelating hexagons, which was in sharp contrast to the boat configuration of the imino-alcoholate ligands observed in the second complex 2c. Chemical vapor deposition (CVD) experiments were conducted at deposition temperatures of 250-350 degreesC. Scanning electron micrographs (SEM) were taken to reveal the surface morphologies and grain sizes of the Pd metal thin films. The resulting thin films were found to contain a low level of carbon and oxygen impurities using O-2 as the carrier gas, as measured by X-ray photoelectron spectroscopy (XPS).[[fileno]]2010302010012[[department]]化學
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Influence of diluent alkyl substitution on the extraction of Am(III) and Eu(III) by a 6,6’-bis(1,2,4-triazin-3-yl)-2,2’-bipyridine ligand dissolved in alkylated cyclohexanone Diluents
Full text linkSeveral alkylated cyclohexanones were investigated as potential diluents for the selective extraction of Am(III) from Eu(III) from nitric acid solutions by the CyMe4-BTBP ligand. No significant extraction of either of the metal ions was observed for these diluents themselves. In the extractions from 1 M HNO3, 3-methylcyclohexanone and 4-methylcyclohexanone gave comparable results to cyclohexanone whereas in the extractions from 4 M HNO3, 2-methylcyclohexanone, 3-methylcyclohexanone and 4-methylcyclohexanone all gave superior results. For the monomethylated diluents, DAm and SFAm/Eu decreased in the order of alkyl substitution 2 > 4 ~ 3. However, alkyl substitution of cyclohexanone significantly slows down the extraction kinetics compared to cyclohexanone, and the position of alkyl substitution was found to play an important role in the solvents properties. 3-Methylcyclohexanone was identified as the most promising of the diluent
Characterization and reliability of low dielectric constant fluorosilicate glass and silicon rich oxide process for deep sub-micron device application
No full text[[abstract]]Fluorosilicate Glass (FSG) with low dielectric constant currently has been replaced as an alternative to SiO2 for device speed improvement. However, several integration aspects, such as Fluorine (F) distribution, F thermal stability, gap fill capability, capacitance reduction and via resistance of FSG prepared by the high density plasma (HDP) chemical vapor deposition (CVD) method are of concern for sub-0.18-mum devices. In this study, HDP-FSG films show different F concentrations at different locations on an 8-inch wafer. In addition, the FSG film shows poor thermal stability and F diffuses out of the film after high temperature annealing and the pressure cook test (PCT). However, the thermal stability of FSG film can be improved by capping with an oxide layer. The results indicate that silicon rich oxide (SRO) has a better effect at blocking the F diffusion out of FSG films at high temperature than plasma enhanced oxide (PE-OX). For the gap fill capability, HDP-FSG can fill all 0.23-mum gaps and some of the 0.21-mum gaps with an aspect ratio <3.8 but not the 0.19-mum gaps. A 8000 Angstrom HDP-FSG film with 600 Angstrom USG liner and 2000 Angstrom cap layer shows approximately 7.5 to 7.7% capacitance reduction on 0.23/0.23-mum gaps when compared with USG (undoped silicate glass). In addition, FSG has a larger capacitance reduction on the wider metal lines than the thinner metal lines at the same gap size due to a capacitance fringe effect. The via resistance for 0.26 mum unlanded via (which allow minor photo mis-alignment) of HDP-FSG film is also similar to that of USG. (C) 2001 Elsevier Science B.V. All rights reserved.[[note]]SC
老年痴呆患者疼痛评估工具的研究进展
No full textAuthor name used in this publication: 雷逸华, Liu Yat-waTitle in Traditional Chinese: 老年癡呆患者疼痛評估工具的研究進展Journal title in Traditional Chinese: 中華護理雜誌2007-2008 > Academic research: refereed > Publication in refereed journalVersion of RecordPublishedVoR allowe
Valvular replacement for patients with aortic stenosis and severe left ventricular dysfunction.
No full textSpermatozoa of lead-exposed rats had increased capacitation and acrosome reaction and reduced capability of oocyte penetration.
No full textIncreased liver and lupus mortalities in 24 years follow-up of the Taiwanese people highly exposed to polychlorinated biphenyls and dibenzofurans.
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