1,720,975 research outputs found
PECVD of SiOxNyCzHw thin films from hexamethyl-disilazane containing feed. Investigation on chemical characteristics and ageing behaviour
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Plasma deposition of a-C:H,F thin films from H2-C2F6 fed RF Glow Discharges
No full textThin films have been deposited from 0-20% C(2)F(6)-H(2) fed radio-frequency (RF) glow discharges in a triode reactor. Deposits contain carbon, hydrogen and fluorine in a variable extent, and can be classified as a-C: H, F materials. The effects of feed composition, substrate temperature and substrate bias on the overall deposition process and on the chemical composition of the films have been studied. Actinometric optical emission spectroscopy has been utilized as a diagnostic tool of the plasma, while the film composition has been investigated by means of electron spectroscopy for chemical analysis. A deposition mechanism is proposed which involves carbon atoms and CH radicals as film precursors, and fluorine atoms as responsible for the material fluorination. The net deposition rate is the result of competition between deposition kinetics and ablation steps, all steps being assisted by ion
The role of substrate temperature and bias in the plasma-deposition from tetramethylsilane
No full textThin transparent polymeric films have been deposited from low-pressure argon/tetramethylsilane radio-frequency glow discharges at controlled substrate bias and temperature. The effect of positive ion bombardment and substrate temperature on both film growth rate and chemical composition has been studied. An account of the post-discharge fast oxidation of films exposed to oxygen is also given. A general deposition mechanism proposed
Fluorinated Diamond-Like carbon films deposited from RF Glow Discharges in a triode reactor
No full textDiamondlike carbon thin films have been deposited by H2-C2F6 fed rf-glow discharges in a triode reactor. Raman spectroscopy and electron spectroscopy for chemical analysis have been utilized as diagnostic tools to investigate structural properties and chemical composition of deposited films. Transitions in film properties have been observed, from those typical of hydrogenated polymers to those of diamondlike and fluorinated polymers, by changing feed composition, substrate bias, and substrate temperature. In particular, it has been shown that the energy of the ions bombarding the growing films, as well as the fluorine contents in the films is the most critical parameter to obtain materials with diamondlike structure
Plasma polymers and plasma etching group of the Centro di Studio per la Chimica dei Plasma
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Ion-beam sputtering deposition of fluoropolymer thin films
No full textIt is shown that it is possible to deposit thin films with various CFx composition (1.26 less-than-or-equal-to x less-than-or-equal-to 1.83) by ion-beam sputtering. These materials with ''teflon-like'' composition have been deposited at room temperature by Ar ion-beam sputtering of a teflon target; the film chemical composition has been determined by electron spectroscopy for chemical analysis. The fluorine-to-carbon ratio of the films, as well as their crosslinking degree, is shown to depend on the energy of the ions impinging on the target
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