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    Thermal stability study of BaAl2Si2O8 : Eu2+ phosphor using its polymorphism for plasma display panel application

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    We have evaluated the thermal stability of BaAl2Si2O8:Eu2+ (BAS:Eu2+) phosphor using its polymorph property and hexagonal and monoclinic crystal structure, depending upon firing temperature for plasma display panel application. When BAS:Eu2+ samples having each characteristic crystal structure were baked at 500 degrees C in air for 30 min, the baked monoclinic BAS:Eu2+ showed the same photoluminescence (PL) intensity as the fresh one, whereas the baked hexagonal one lost its PL intensity significantly, corresponding to about 34%. From analyses of electron spin resonance on Eu2+ and Rietveld refinement, the difference of thermal stability between hexagonal and monoclinic BAS:Eu2+ could be ascribed to both the crystal structure of host materials and the average interatomic distances between the Eu2+ ion and oxygen which plays the key role of shield for Eu2+ ions against an oxidation atmosphere.This study was supported by Korea Science and Engineering Foundation (KOSEF) and Ministry of Science & Technology (MOST), Korean government, through its National Nuclear Technology Program

    Combined Rietveld refinement of CaMgSi2O6 : Eu2+ using X-ray and neutron powder diffraction data

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    The authors are grateful to Dr S. W. Jang at the Hanaro Center in Korea Atomic Energy Research Institute for their assistance in collecting neutron powder diffraction data. This work was partially supported by the Centre for Nanoscale Mechatronics and Manufacturing

    Thermal stability study of Eu2+-doped BaAl2Si 2O8 phosphor using polymorphism for plasma display panel applications

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    This study was supported by Korea Science and Engineering Foundation (KOSEF) and Ministry of Science & Technology (MOST), Korean government, through its National Nuclear Technology Program
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