1,721,342 research outputs found
High-current-gain Ga0.51In0.49P/GaAs heterojunction bipolar transistor grown by gas-source molecular beam epitaxy
No full text
An Investigation into the Forming Limits of Sintered Porous Materials under Different Operational Conditions
No full textCarbon and nitrogen mineralization of sewage sludge compost in soils with different initial pH.
No full text
GSMBE grown (GaIn)P/GaAs heterojunction bipolar transistors exhibiting current gains up to 590
No full textDeposition and characterization of copper indium gallium sulphide thin films fabricated by chemical vapour deposition with metal chloride precursors
No full textChemical vapour deposition (CVD) is a widely used method in the optoelectronics and semiconductor industries, producing high purity thin films, in crystalline, amorphous and epitaxial phases. A variety of materials can be produced in this way although for the most part use of the technique has focussed on polysilicon, silicon dioxide, silicon nitride and metallic materials. The advantages of CVD processing, which offers offer superior quality compared to conventional methods such as sputtering or co-evaporation, include conformality, coverage, and stoichiometry control. The process should also be more economical and scalable to large substrates as it can take place at atmospheric pressure rather than under vacuum conditions
- …
