2,271 research outputs found

    Letter from Cy Donner to Michi Weglyn, June 2, 1967

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    A letter from Cy Donner to Michi Weglyn encouraging her to come out to California to talk to producers about two shows called "Youthquake" and "Pretty Talk".These materials are from box 73 and 74 of the Frank Chin Papers. The Frank Chin Papers contain personal and professional correspondence between Frank Chin and Michi Weglyn relating to particular projects on which either author was working as well as files related to the Day of Remembrance Tribute to Michi Weglyn

    Deposition cycle of atomic layer deposition HfO2 film: Effects on electrical performance and reliability

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    [[abstract]]Varying thicknesses of the HfO2 films prepared by atomic layer deposition (ALD) were compared in terms of electrical properties and reliability. Scaling the physical thickness of the HfO2 dielectric did not increase the capacitance as expected due to the thicker interfacial SiOX layer obtained by the oxidation process used for thermal annealing. After thermal annealing, HfO2 crystallization increased with the thickness of HfO2 film, which then increases the dielectric constant for the bulk HfO2 film. The breakdown behaviors of the HfO2 gate dielectric film were not scaled to thickness, improved with HfO2 thickness until saturation. The reliability characteristics of the HfO2 dielectric under unipolar AC stressing were also evaluated. Dielectric breakdown failure time of unipolar AC stressing becomes longer in comparison to that stressed in constant voltage stress. As the thickness of the HfO2 dielectric increases, a larger lifetime enhancement is detected due to the effective charge de-trapping for thicker dielectrics under AC stressing. Crown Copyright (c) 2012 Published by Elsevier B.V. All rights reserved.[[note]]SC
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