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The interface study of photoresist/underlayer using hybrid x-ray reflectivity and x-ray standing wave approach
Full text linkThe work was performed in the frame of the NEXT3D project funded by TKI Connecting Industry call with the support of Malvern Panalytical. We kindly acknowledge S. Yakunin for friendly discussion on XSW technique. We kindly acknowledge the help of Hironori Oka and Keita Kato (Fujifilm Electronic Materials Europe) for providing photoresist materials. We kindly acknowledge Milen Gateshki (Malvern Panalytical) for useful discussions and help with editing of this manuscript
Secondary electron distribution and photosensitivity performance of resists for extreme ultraviolet (EUV)
No full textSecondary electron distribution and photosensitivity performance of resists for extreme ultraviolet (EUV)
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