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COMMENTO ALL' ARTICOLO 91del d.lgs. 3 aprile 2006, n. 152 in Commentario breve al Codice dell'Ambiente a cura di L. Costato e F. Pellizzer
No full textReversing a potential polarity for reading phase change cells to shorten a recovery delay after programming
No full textA potential supplied to selected cells in a Phase Change Memory (PCM) is reversed in polarity following a program operation to suppress a recovery time and provide device stabilization for a read operation
Commento all'art. 184-bis
No full textIl commento tratta le principali problematiche relative alla figura del "sottoptodotto" e della sua distinzione da l "rifiuto", alla luce della giurisprudenza e della normativa nazionale ed europe
MODIFIED RESET STATE FOR ENHANCED READ MARGIN OF PHASE CHANGE MEMORY
No full textSubject matter disclosed herein relates to techniques involving a structural relaxation (SR) phenomenon for increasing resistance of a Reset state of phase change memory
A new model of gate capacitance as a simple tool to extract MOS parameters
No full textThis paper tackles the difficult task to extract MOS parameters by a new model of the gate capacitance that takes into account both poly-Si depletion and charge quantization and includes temperature effects. A new fast and iterative procedure, based on this simplified self-consistent model, will be presented to estimate simultaneously the main MOS system parameters (oxide thickness, substrate, and poly-Si doping) and oxide held, surface potentials at the Si/SiO2 and at the poly-Si/SiO2 interfaces. Its effectiveness will be demonstrated by comparing oxide field and oxide thickness to those extracted by other methods proposed in the literature. Moreover, these methods are critically reviewed and we suggest improvements to reduce their errors, The agreement between CV simulation and experimental data is good without the need of any free parameter to improve the fitting quality for several gate and substrate materials combinations. Finally, a simple law to estimate substrate and poly-Si doping in n+/n+ MOS capacitor from CV curves is proposed
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