22 research outputs found
Author Correction: Highly accurate determination of heterogeneously stacked Van-der-Waals materials by optical microspectroscopy
No full textThe original version of this Article contained an error in Equation 1. (Formula Presented.).now reads:(Formula Presented.)As a result, Equation 2 was incorrect.(Formula Presented.).now reads:(Formula Presented.).The original Article has been corrected.13
Three Dissertation Horn Recitals featuring Contemporary German Compositions
No full textIn lieu of a written dissertation, three recital programs of music for horn were presented.
The three dissertation recitals focused on the work of German composers in the latter half of the twentieth century and into the twenty-first. A combination of well-known and lesser-known compositions, these performances showcased the breadth of repertoire available to horn players to study and play.
Sunday, 15 September, 2024, 3:00pm; School of Music, Theatre & Dance, Stamps Auditorium, University of Michigan. Dr. Liz Ames, piano; Alexis Phinney, flute; Mark Doerr, oboe; Cory Tamez, clarinet; Jake Wellington-Byrne, bassoon. Program: Siegfried Matthus, Hoch willkommt das Horn; Harald Genzmer, Sonatina für Horn und Klavier; Eva Schorr, Sonate für Horn in F und Klavier; Hans Werner Henze, Quintett; Jörg Widmann, Air für Horn.
Monday, 2 December, 2024, 8:00pm; School of Music, Theatre & Dance, Stamps Auditorium, University of Michigan. Dr. Liz Ames, piano; Asher Wulfman, violin. Program: Volker David Kirchner, Tre Poemi; Christoph Weinhart, Sonate für Horn und Klavier; Hermann Neuling, Bagatelle für Tiefes Horn und Klavier; Friedrich Goldmann, Trio für Violine, Horn und Klavier.
Tuesday, 21 January, 2025, 8:00pm; School of Music, Theatre & Dance, McIntosh Theatre, University of Michigan. Dr. Liz Ames, piano; Alexis Phinney, flute; Thomas Welnick, oboe; Cory Tamez, clarinet; Ben Weppler, bassoon. Program: Hermann Baumann, Elegie für Naturhorn; Detlev Glanert, Déjà Vu; Friedrich Zehm, Ballade für Horn und Klavier; Hans Georg Pflüger, Impute für Horn und Klavier; Paul Hindemith, Hornkonzert.Doctor of Musical Arts (DMA)Music: PerformanceUniversity of Michigan, Horace H. Rackham School of Graduate Studieshttp://deepblue.lib.umich.edu/bitstream/2027.42/199480/1/bdwulf_1.pd
Bistable Organic Electrochemical Transistors: Enthalpy vs. Entropy
No full textOrganic electrochemical transistors (OECTs) underpin a range of emerging technologies, from bioelectronics to neuromorphic computing, owing to their unique coupling of electronic and ionic charge carriers. In this context, various OECT systems exhibit significant hysteresis in their transfer curve, which is frequently leveraged to achieve non-volatility. Meanwhile, a general understanding of its physical origin is missing. Here, we introduce a thermodynamic framework that readily explains the emergence of bistable OECT operation via the interplay of enthalpy and entropy. We validate this model through temperature-resolved characterizations, material manipulation, and thermal imaging. Further, we reveal deviations from Boltzmann statistics for the subthreshold swing and reinterpret existing literature. Capitalizing on these findings, we finally demonstrate a single-OECT Schmitt trigger, thus compacting a multi-component circuit into a single device. These insights provide a fundamental advance for OECT physics and its application in non-conventional computing, where symmetry-breaking phenomena are pivotal to unlock new paradigms of information processing
Bivariate and Multivariate Time Series Analysis Techniques and their Potential Impact for Seizure Prediction
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Phosphate Starvation Alters Abiotic-Stress-Induced Cytosolic Free Calcium Increases in Roots.
No full textPhosphate (Pi) deficiency strongly limits plant growth, and plant roots foraging the soil for nutrients need to adapt to optimize Pi uptake. Ca2+ is known to signal in root development and adaptation but has to be tightly controlled, as it is highly toxic to Pi metabolism. Under Pi starvation and the resulting decreased cellular Pi pool, the use of cytosolic free Ca2+ ([Ca2+]cyt) as a signal transducer may therefore have to be altered. Employing aequorin-expressing Arabidopsis (Arabidopsis thaliana), we show that Pi starvation, but not nitrogen starvation, strongly dampens the [Ca2+]cyt increases evoked by mechanical, salt, osmotic, and oxidative stress as well as by extracellular nucleotides. The altered root [Ca2+]cyt response to extracellular ATP manifests during seedling development under chronic Pi deprivation but can be reversed by Pi resupply. Employing ratiometric imaging, we delineate that Pi-starved roots have a normal response to extracellular ATP at the apex but show a strongly dampened [Ca2+]cyt response in distal parts of the root tip, correlating with high reactive oxygen species levels induced by Pi starvation. Excluding iron, as well as Pi, rescues this altered [Ca2+]cyt response and restores reactive oxygen species levels to those seen under nutrient-replete conditions. These results indicate that, while Pi availability does not seem to be signaled through [Ca2+]cyt, Pi starvation strongly affects stress-induced [Ca2+]cyt signatures. These data reveal how plants can integrate nutritional and environmental cues, adding another layer of complexity to the use of Ca2+ as a signal transducer
100 nm half–pitch double exposure KrF lithography using binary masks
No full textIn this paper we investigate the process margin for the 100nm half - pitch double exposure KrF lithography using binary masks for different illumination settings. The application of Double Exposure Lithography (DEL) would enlarge the capability of 248 nm exposure technique to smaller pitch e.g. for the integration of dedicated layers into 0.13 μm BiCMOS with critical dimension (CD) requirements exceeding the standard 248 nm lithography specification. The DEL was carried out with a KrF Scanner (Nikon S207D, NALens = 0.82) for a critical dimension (CD) of 100nm half pitch. The chemical amplified positive resists SL4800 or UV2000 (Rohm & Haas) with a thickness of 325nm were coated on a 70 nm AR10L (Rohm & Haas) bottom anti-reflective coating (BARC). With a single exposure and using binary masks it is not possible to resolve 100nm lines with a pitch of 200 nm, due to the refraction and the resolution limit. First we investigated the effect of focus variation. It is shown that the focus difference of 1st and 2nd exposure is one critical parameter of the DEL. This requires a good focus repeatability of the scanner. The depth of focus (DOF) of 360 nm with the coherence parameter σ = 0.4 was achieved for DEL with SL4800 resist. The influence of the better resist resolution of UV2000 on the process window will be shown (DOF = 460 nm). If we change the focus of one of the exposures the CD and DOF performance of spaces is reduced with simultaneous line position changing. Second we investigated the effect of different illumination shapes and settings. The results for conventional illumination with different values for σ and annular illumination with σinner = 0.57 and σouter = 0.85 will be shown. In summary, the results show that DEL has the potential to be a practical lithography enhancement method for device fabrication using high NA KrF tool generation
Ultrathin TiN membranes as a technology platform for CMOS integrated MEMS and BioMEMS devices
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