1,720,989 research outputs found
Layer on photoresist lines with an Ar/SiCl4/O2 inductively coupled plasma: a modeling investigation
No full textModeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime
No full textPlasma influence on the attenuation of line width roughness of EUV photoresist lines ranging from 40 to 22 nm half pitch
No full textChallenges for smoothing EUV photoresist line-width-roughness: plasma treatment from 40 to 22 nm half pitches
No full text
- …
