1,720,962 research outputs found
Non-destructive surface profile measurement of a patterned sample using acousto-optic tunable filter
Calibration method for rotating-analyser-type spectral imaging ellipsometers
Data reduction and calibration procedures are introduced for a,novel rotating-analyser-type spectral imaging ellipsometer. Using a monaxial power spectrograph, we developed a unique spectral imaging ellipsometer. It combines one-dimensional imaging ellipsometry with spectroscopic ellipsometry, and enables real-time measurement of the optical parameters and dimensional structures of patterned or multilayered thin film. It also has more calibration factors than conventional ellipsometers. We therefore present a method using Jones matrices for describing the polarization sensitivity of the spectrograph and random noise of the CCD array. For a patterned SiO2 layer on a silicon wafer, we used the spectral imaging ellipsometer to obtain a one-dimensional thickness profile.For this research, the authors acknowledge the support of the
NT-BTMeasurement and Manipulation Project and the Center
for Nanoscale Mechatronics and Manufacturing
Imaging ellipsometry combined with surface plasmon resonance for real-time biospecific interaction analysis
Enhancement of biomolecular detection sensitivity by surface plasmon resonance ellipsometry
Mono-axial power spectrograph for a spectral imaging ellipsometer: Design and experimental results
A novel mono-axial power spectrograph for spectral imaging ellipsometry is described in this paper. Spectral imaging ellipsometers employing the proposed mono-axial power spectrograph can measure information about thin films along the line of the entrance slit of the spectrograph. The mono-axial power spectrograph is simply composed of an entrance slit, a holographic transmission grating and a focusing cylindrical doublet. Several features of the proposed spectrograph give some benefits when used with an imaging ellipsometer. Above all, the holographic transmission grating guarantees polarization insensitivity of the incident wave to the spectrograph. Therefore, the polarization dependency and calibration factors in the spectral imaging ellipsometer can be minimized. Also, the simple structure of the spectrograph employing a cylindrical doublet allows optical compatibility with conventional ellipsometers and high adaptability to spectral imaging ellipsometers. The spectral resolution of the spectrograph is 5 nm and it has a spectral range from 400 to 800 nm. The focal length of the manufactured mono-axial power spectrograph is 25.4 mm and the total system dimension is less than 120 mm(L) × 100 mm(W) × 100 mm(H). The design procedure and the results of experiments to measure the spatial transmittance are discussed for some transmission samples
One-dimensional Spectroscopic Measurement of Patterned Structures Using a Custom-built Spectral Imaging Ellipsometer
2003 International Conference on Characterization and Metrology for ULSI TechnologyRedistribution subject to AIP license or copyright, see http://proceedings.aip.org/proceedings/cpcr.js
A new spectral imaging ellipsometer for measuring the thickness of patterned thin films
We proposed spectral imaging ellipsometry that uniquely combines one-dimensional imaging and spectroscopic ellipsometry. This type of ellipsometry enables the measurement of the optical parameters and dimensional structures of patterned or multilayered thin films. We demonstrated the result of the measurement of the thickness of patterned SiO2 layers with 3 nm Short Note accuracy and 200 mum spatial resolution
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