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Angle resolved XPS characterization of the formation of Cl and Br bonds in poly-silicon etching and its cleaning
No full textTaN metal gate etch with BCl3/O2 plamsa: gate profile and impact on high-k removal process
No full textAngle resolved XPS characterization of the formation of Cl and Br bonds in poly-silicon etching and its cleaning
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Large-scale production techniques for photonic nanostructures using excimer laser replication
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Fabrication of ultra-compact photonic structures in Silicon-on-Insulator (SOI) using 248nm deep lithography
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