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242 research outputs found
Investigation of a CF4/Ar RF gas discharge
Author
Meijer P.M.
Vallinga P.M.
Hoog de, F.J.
Smits A.J.
Publication venue
Publication date
01/01/1987
Field of study
No full text
Pure OAI Repository
Investigation of a CF4/Ar RF gas discharge
Author
Meijer P.M.
Vallinga P.M.
Hoog de, F.J.
Smits A.J.
Publication venue
Publication date
01/01/1987
Field of study
No full text
Pure OAI Repository
Investigation of a CF4/Ar RF gas discharge
Author
Meijer P.M.
Vallinga P.M.
Hoog de, F.J.
Smits A.J.
Publication venue
Publication date
01/01/1987
Field of study
No full text
Pure OAI Repository
In situ ellipsometry : an accurate analysis of films during plasma deposition and plasma etching
Author
Zeeuw CJH de
Timmermans CJ
+8 more
Timmermans C.J.
Schram DC Daan
Schram D.C.
Hoog FJ Frits de
de Zeeuw C.J.H.
Hoog de, F.J.
Kroesen GMW Gerrit
Kroesen G.M.W.
Publication venue
Publication date
01/01/1987
Field of study
No full text
Pure OAI Repository
Electron densities in an RF etch plasma
Author
Bisschops T.H.J.
Flipsen R.F.
Schram D.C.
Publication venue
Publication date
01/01/1987
Field of study
No full text
Pure OAI Repository
In situ ellipsometry : an accurate analysis of films during plasma deposition and plasma etching
Author
Timmermans C.J.
Schram D.C.
+3 more
de Zeeuw C.J.H.
Hoog de, F.J.
Kroesen G.M.W.
Publication venue
Publication date
01/01/1987
Field of study
No full text
Pure OAI Repository
Measurements of density and temperature profiles in an argon inductively coupled plasma
Author
Mullen van der, J.J.A.M.
van Lammeren A.C.A.P.
+3 more
Schram D.C.
Sijde van der, B.
Nowak S.
Publication venue
Publication date
01/01/1987
Field of study
No full text
Pure OAI Repository
Measurements of density and temperature profiles in an argon inductively coupled plasma
Author
Sijde B Bart van der
Mullen van der, J.J.A.M.
+8 more
van Lammeren A.C.A.P.
Schram DC Daan
Schram D.C.
Sijde van der, B.
Nowak S
Mullen JJAM Joost van der
Lammeren ACAP Andre van
Nowak S.
Publication venue
Publication date
01/01/1987
Field of study
No full text
Pure OAI Repository
Electron densities in an RF etch plasma
Author
Bisschops THJ
Bisschops T.H.J.
+4 more
Flipsen R.F.
Flipsen RF
Schram DC Daan
Schram D.C.
Publication venue
Publication date
01/01/1987
Field of study
No full text
Pure OAI Repository
A. Kinbara and I. Kondo
Author
Publication venue
Publication date
2014
Field of study
No full text
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